Photoresist composition and method of manufacturing a semiconductor device

A photoresist composition, comprising:

• a photoacid generator;
• a polymer;
• metal nanoparticles complexed with one or more organic ligands;
• and
• a crosslinker,
• wherein the polymer has a structure
• wherein A1 is a substituted or unsubstituted C1-C30 alkyl group, C3-C30 cycloalkyl group, C1-C30 hydroxylalkyl group, C2-C30 alkoxy group, C3-C30 alkoxyl alkyl group, C2-C30-acetyl group, C3-C30 acetylalkyl group, C1-C30 carboxyl group, C2-C30 alkyl carboxyl group, C4-C30 cycloalkyl carboxyl group, saturated or unsaturated C1-C30 heterocyclic group, or C1-C30 chain,
• wherein A2 and A3 are independently a substituted or unsubstituted C6-C30 aryl group, C1-C30 alkyl group, C3-C30 cycloalkyl group, C1-C30 hydroxylalkyl group, C2-C30 alkoxy group, C3-C30 alkoxyl alkyl group, acetyl group, C3-C30 acetylalkyl group, C1-C30 carboxyl group, C2-C30 alkyl carboxyl group, C4-C30 cycloalkyl carboxyl group, saturated or unsaturated C3-C30 hydrocarbon ring, saturated or unsaturated C1-C30 heterocyclic group, or C1-C30 chain, ring, or 3-D structure,
• wherein R1 is a substituted or unsubstituted C4-C15 chain, cyclic, or 3-D structure alkyl group, C4-C15 cycloalkyl group, C4-C15 hydroxylalkyl group, C4-C15 alkoxy group, or C4-C15 alkoxyl alkyl group,
• wherein a proportion of x, y, and z in the polymer is 0<x/(x+y+z)<1, 0<y/(x+y+z)<1, and 0<z/(x+y+z)<1,
• the crosslinker is a monomer, oligomer, or polymer including one or more structures selected from
• wherein B1, B2, B3, B4, and D are each independently a substituted or unsubstituted C6-C30 aryl group, C1-C30 alkyl group, C3-C30 cycloalkyl group, C2-C30 hydroxylalkyl group, C2-C30 alkoxy group, C3-C30 alkoxyl alkyl group, acetyl group, C3-C30 acetylalkyl group, C1-C30 carboxyl group, C2-C30 alkyl carboxyl group, C4-C30 cycloalkyl carboxyl group, saturated or unsaturated C3-C30 hydrocarbon ring, saturated or unsaturated C1-C30 heterocyclic group, or a C1-C30 chain, ring, or 3-D structure, and
• wherein R and Ra are each independently a substituted or unsubstituted C4-C15 chain, cyclic, or 3-D structure alkyl group, C4-C15 cycloalkyl group, C4-C15 hydroxylalkyl group, C4-C15 alkoxy group, or C4-C15 alkoxyl alkyl group.

A photoresist composition, comprising:

• a photoactive compound;
• a polymer;
• metal nanoparticles;
• and
• a crosslinker,
• wherein the polymer has a structure
• wherein A1 and A2 are each independently a substituted or unsubstituted C1-C30 alkyl group, C3-C30 cycloalkyl group, C1-C30 hydroxylalkyl group, C2-C30 alkoxy group, C3-C30 alkoxyl alkyl group, acetyl group, C3-C30 acetylalkyl group, C1-C30 carboxyl group, C2-C30 alkyl carboxyl group, C4-C30 cycloalkyl carboxyl group, saturated or unsaturated C3-C30 hydrocarbon ring, saturated or unsaturated C1-C30 heterocyclic group, or C1-C30 chain, ring, or 3-D structure,
• wherein A3 is a substituted or unsubstituted C1-C30 alkyl group, C3-C30 cycloalkyl group, C1-C30 hydroxylalkyl group, C2-C30 alkoxy group, C3-C30 alkoxyl alkyl group, acetyl group, C3-C30 acetylalkyl group, C1-C30 carboxyl group, C2-C30 alkyl carboxyl group, C4-C30 cycloalkyl carboxyl group, saturated or unsaturated C1-C30 heterocyclic group, or C1-C30 chain or 3-D structure,
• wherein R1 is an acid labile group selected from one or more of
• wherein a proportion of x, y, and z in the polymer is 0<x/(x+y+z)<1, 0<y/(x+y+z)<1, and 0<z/(x+y+z)<1,
• the crosslinker is a monomer, oligomer, or polymer including one or more structures selected from
• wherein B1, B2, B3, B4, and D are each independently a substituted or unsubstituted C6-C30 aryl group, C1-C30 alkyl group, C3-C30 cycloalkyl group, C2-C30 hydroxylalkyl group, C2-C30 alkoxy group, C3-C30 alkoxyl alkyl group, acetyl group, C3-C30 acetylalkyl group, C1-C30 carboxyl group, C2-C30 alkyl carboxyl group, C4-C30 cycloalkyl carboxyl group, saturated or unsaturated C3-C30 hydrocarbon ring, saturated or unsaturated C1-C30 heterocyclic group, or a C1-C30 chain, ring, or 3-D structure, and
• wherein R and Ra are each independently a substituted or unsubstituted C4-C15 chain, cyclic, or 3-D structure alkyl group, C4-C15 cycloalkyl group, C4-C15 hydroxylalkyl group, C4-C15 alkoxy group, or C4-C15 alkoxyl alkyl group.