G03F 1/52
Reflectors
G03F1/52 (Reflectors) appears on 144 US grants and 186 published applications in this corpus.
Search patents in G03F- Granted patents
- 144
- Published applications
- 186
- Assignees
- 51
- Inventors
- 329
- Latest grant
- 9 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 0 | 0 |
| 2011 | 1 | 2 |
| 2012 | 0 | 1 |
| 2013 | 4 | 8 |
| 2014 | 3 | 7 |
| 2015 | 11 | 13 |
| 2016 | 8 | 9 |
| 2017 | 9 | 4 |
| 2018 | 5 | 12 |
| 2019 | 6 | 17 |
| 2020 | 13 | 18 |
| 2021 | 13 | 20 |
| 2022 | 17 | 18 |
| 2023 | 18 | 17 |
| 2024 | 14 | 16 |
| 2025 | 10 | 9 |
| 2026 | 7 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Blank mask and photomask using the same9 Jun 2026US 12,650,640 B2LuminaMask Co., Ltd.
- Lithography system and methods2 Jun 2026US 12,645,150 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method of annealing reflective photomask by using laser12 May 2026US 12,625,424 B2Samsung Electronics Co., Ltd.
- Fully reflective phase-edge mask for EUV lithography3 Feb 2026US 12,541,143 B2Taiwan Semiconductor Manufacturing Company.Ltd
- EUV lithography mask with a porous reflective multilayer structure27 Jan 2026US 12,535,727 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Euv photomask and manufacturing method thereof8 Oct 2026US 2026/0310060 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Reflective photomask and method for manufacturing reflective photomask1 Oct 2026US 2026/0299398 A1Rapidus Corporation
- Reflective mask blank, reflective mask, reflective mask blank manufacturing method, and reflective mask manufacturing method17 Sep 2026US 2026/0277093 A1AGC Inc.
- Structure and method for surface plasmon lithography imaging, and computer-readable medium17 Sep 2026US 2026/0277112 A1Institute of Microelectronics, Chinese Academy of Sciences
- Reflective mask blank and reflective mask6 Aug 2026US 2026/0227686 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same309US 8,828,625 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Antireflection coating for highly reflective photolithographic layers comprising chromium oxide or chromium suboxide49US 5,672,243 AMosel Vitelic, Inc. · 1997
- Extreme ultraviolet mask blank with multilayer absorber and method of manufacture27US 10,747,102 B2APPLIED Materials.Inc. · 2020
- Unit magnification optical system with improved reflective reticle24US 5,040,882 AGeneral Signal Corporation · 1991
- Circuit structure with an anti-reflective layer14US 6,043,547 AMosel Vitelic, Inc. · 2000