Reflective mask blank, reflective mask, reflective mask blank manufacturing method, and reflective mask manufacturing method
AssigneeAGC Inc.
InventorsTakeshi TOMIZAWA, Daijiro Akagi
Life of this patent
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Abstract
A reflective mask blank has a substrate, a multilayer reflective film configured to reflect EUV light, and an absorbing film configured to absorb the EUV light in this order, and has a conductive film on the opposite side of the multilayer reflective film from the substrate. A coefficient of dynamic friction of the conductive film on the surface opposite the substrate is less than 0.45, measured in a nitrogen atmosphere at room temperature.
Claims12
A reflective mask blank comprising a substrate, a multilayer reflective film configured to reflect EUV light, and an absorbing film configured to absorb the EUV light in this order, and having a conductive film on the opposite side of the multilayer reflective film from the substrate,
- wherein a coefficient of dynamic friction of the conductive film on the surface opposite the substrate is less than 0.45, measured in a nitrogen atmosphere at room temperature.
A reflective mask blank manufacturing method comprising:
- preparing a substrate having a first main surface and a second main surface facing opposite to the first main surface;
- forming a multilayer reflective film that reflects EUV light and an absorbing film that absorbs EUV light on the first main surface of the substrate in this order;
- and
- forming a conductive film on the second main surface of the substrate,
- wherein a coefficient of dynamic friction of the conductive film on the surface opposite the substrate is less than 0.45, measured in a nitrogen atmosphere at room temperature.
Dependencies are inferred from the claim text.