Back to results
US 2026/0227686 A1Published application
Reflective mask blank and reflective mask
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTaiga OGOSE, Ryoto KAWAMURA, Yukio INAZUKI, Yuta ARATA
Life of this patent
Estimating the term…
Abstract
A reflective mask blank 100 has a substrate 1; a multilayer reflective film 2 that reflects exposure light and that is provided on one main surface of the substrate 1; and an absorber film 5 provided above the multilayer reflective film 2. The absorber film 5 contains one or both of ruthenium (Ru) and platinum (Pt), and further contains one or both of carbon (C) and silicon (Si). A surface of the absorber film 5 has a root mean square roughness (Sq) of 0.40 nm or less.
Claims10
A reflective mask blank comprising:
- a substrate;
- a multilayer reflective film that reflects exposure light and that is provided on one main surface of the substrate;
- and
- an absorber film provided above the multilayer reflective film,
- wherein the absorber film contains one or both of ruthenium (Ru) and platinum (Pt), and further contains one or both of carbon (C) and silicon (Si), and
- wherein a surface of the absorber film has a root mean square roughness (Sq) of 0.40 nm or less.
3 more elements
Dependencies are inferred from the claim text.