G03F 1/48
Protective coatings
G03F1/48 (Protective coatings) appears on 262 US grants and 366 published applications in this corpus.
Search patents in G03F- Granted patents
- 262
- Published applications
- 366
- Assignees
- 110
- Inventors
- 576
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 4 | 0 |
| 1996 | 0 | 0 |
| 1997 | 3 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 0 | 0 |
| 2001 | 3 | 2 |
| 2002 | 0 | 3 |
| 2003 | 5 | 9 |
| 2004 | 3 | 7 |
| 2005 | 6 | 8 |
| 2006 | 7 | 5 |
| 2007 | 1 | 4 |
| 2008 | 1 | 12 |
| 2009 | 4 | 4 |
| 2010 | 6 | 2 |
| 2011 | 3 | 3 |
| 2012 | 1 | 8 |
| 2013 | 4 | 9 |
| 2014 | 9 | 8 |
| 2015 | 16 | 20 |
| 2016 | 14 | 15 |
| 2017 | 11 | 8 |
| 2018 | 14 | 18 |
| 2019 | 9 | 14 |
| 2020 | 13 | 23 |
| 2021 | 17 | 27 |
| 2022 | 24 | 30 |
| 2023 | 14 | 32 |
| 2024 | 22 | 40 |
| 2025 | 20 | 33 |
| 2026 | 7 | 22 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Process method for improving SRAM operating speed15 Sep 2026US 12,740,038 B2Shanghai Huali Integrated Circuit Corporation
- Extreme ultraviolet mask with capping layer2 Jun 2026US 12,645,136 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Mask and method for forming the same21 Apr 2026US 12,607,923 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Substrate with multilayer reflective film, reflective mask blank, reflective mask, and method for manufacturing semiconductor device31 Mar 2026US 12,591,173 B2Hoya Corporation
- Method and apparatus for manufacturing a photomask from a blank mask3 Mar 2026US 12,566,369 B2SK enpulse Co., Ltd.
- Reflective mask blank, reflective mask, reflective mask blank producing method, and reflective mask producing method8 Oct 2026US 2026/0310066 A1AGC Inc.
- Reflective photomask and method for manufacturing reflective photomask1 Oct 2026US 2026/0299398 A1Rapidus Corporation
- Structure and method for surface plasmon lithography imaging, and computer-readable medium17 Sep 2026US 2026/0277112 A1Institute of Microelectronics, Chinese Academy of Sciences
- Reflective mask blank and reflective mask6 Aug 2026US 2026/0227686 A1Shin-Etsu Chemical Co., Ltd.
- Pellicle and photomask assembly6 Aug 2026US 2026/0227688 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Extreme ultraviolet lithography process and mask331US 8,841,047 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Reflective mask and method of making same330US 8,877,409 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Methods of fabricating a photomask56US 4,405,701 AWestern Electric Company, Inc. · 1983
- Photolithography mask and method of fabrication48US 5,935,733 AIntel Corporation · 1999
- Silicon carbide film for X-ray masks and vacuum windows45US 4,608,326 AHewlett-Packard Company · 1986