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US 2026/0227688 A1Published application
Pellicle and photomask assembly
AssigneeSamsung Electronics Co., Ltd.
InventorsMun Ja Kim, Ouiserg Kim, Junhyung Kim, Changhwan Kim, Young Duk Suh, Seongju Wi
Life of this patent
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Abstract
A pellicle includes a pellicle membrane formed of carbon nanotubes; and a frame directly contacting and connected to a peripheral edge of one side of the pellicle membrane.
Claims20
A pellicle comprising:
- a pellicle membrane formed of carbon nanotubes;
- and
- a frame directly contacting and connected to a peripheral edge of one side of the pellicle membrane.
A pellicle comprising:
- a pellicle membrane formed of carbon nanotubes;
- and
- a frame including a first surface directly contacting and connected to a peripheral edge of one side of the pellicle membrane and a second surface, facing the first surface,
- wherein the frame includes a plurality of grooves in the form of slits that are respectively arranged on an inner peripheral wall surface and an outer peripheral wall surface of the frame and intersect one another along a peripheral direction of the frame and penetrate the first surface of the frame and the second surface of the frame.
1 more element
A photomask assembly comprising:
- a photomask having a coupling surface;
- and
- a pellicle including a pellicle membrane formed of carbon nanotubes and a frame having a first surface directly contacting and connected to a peripheral edge of one side of the pellicle membrane and a second surface coupled to the coupling surface.
Dependencies are inferred from the claim text.