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US 12,607,923 B2Granted
Mask and method for forming the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHsin-Chang Lee, Ping-Hsun Lin, Pei-Cheng Hsu, Hsuan-I Wang, Hung-Yi Tsai, Bo-Wei Shih, Ta-Cheng Lien
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Abstract
A method includes forming a reflective multilayer over a substrate; depositing a first capping layer over the reflective multilayer, wherein the first capping layer is made of a ruthenium-containing material or a chromium-containing material; performing a treatment to the first capping layer to introduce nitrogen or fluorine into the first capping layer; forming an absorption layer over the first capping layer; and patterning the absorption layer.
Claims20
A method, comprising:
- forming a reflective multilayer over a substrate;
- depositing a first capping layer over the reflective multilayer, wherein the first capping layer comprises a ruthenium-containing material or a chromium-containing material;
- performing a treatment to the first capping layer to introduce fluorine into the first capping layer;
- forming an absorption layer over the first capping layer;
- and
- patterning the absorption layer.
3 more elements
A method, comprising:
- forming a reflective multilayer over a substrate;
- forming a first capping layer over the reflective multilayer, wherein the first capping layer comprises a ruthenium-containing material or a chromium-containing material;
- forming a second capping layer over the first capping layer, wherein the second capping layer comprises a ruthenium-containing material or a chromium-containing material, and wherein the second capping layer includes a higher atomic concentration of nitrogen or fluorine than the first capping layer;
- forming an absorption layer over the second capping layer;
- and
- patterning the absorption layer.
3 more elements
A mask, comprising:
- a substrate;
- a reflective multilayer over the substrate;
- a first capping layer over the reflective multilayer, wherein the first capping layer comprises a ruthenium-containing material or a chromium-containing material, and the first capping layer further comprises fluorine;
- and
- a second capping layer over the first capping layer, wherein the second capping layer also comprises fluorine;
- and
- an absorption layer over the second capping layer.
4 more elements
Dependencies are inferred from the claim text.