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US 4,405,701 AGranted
Methods of fabricating a photomask
AssigneeWestern Electric Company, Inc.
InventorsEdward L. Banks, Bruce E. Truax, Laurence S. Watkins
Life of this patent
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Abstract
A photomask (30) used to form patterns on a resist coated semiconductor wafer is comprised of a transparent baseplate (31) having a thin metallic pattern (32) thereon; a transparent, planar coverplate (33) in intimate contact with the patterned baseplate (31) and an index matching fluid (34) interposed therebetween.
Claims2
A method of fabricating a photomask, comprising the steps of:
- placing a substantially flat, light transmissive coverplate in intimate contact with a light transmissive baseplate having a metallic pattern thereon;
- depositing at least one drop of, a refractive index matching fluid at the interface edge of the coverplate and baseplate, said fluid having substantially the same refractive index as said baseplate and said coverplate;
- and
- heating the baseplate, coverplate and the refractive index matching fluid to cause the fluid to flow between the patterned baseplate and the coverplate.
1 more element
Dependencies are inferred from the claim text.