G03F 1/26
Phase shift masks [psm]
Official title: Phase shift masks [PSM]; PSM blanks; Preparation thereof
G03F1/26 (Phase shift masks [psm]) appears on 2,200 US grants and 1,772 published applications in this corpus.
Search patents in G03F- Granted patents
- 2,200
- Published applications
- 1,772
- Assignees
- 354
- Inventors
- 2,377
- Latest grant
- 23 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 5 | 0 |
| 1993 | 26 | 0 |
| 1994 | 56 | 0 |
| 1995 | 69 | 0 |
| 1996 | 75 | 0 |
| 1997 | 79 | 0 |
| 1998 | 90 | 0 |
| 1999 | 95 | 0 |
| 2000 | 70 | 0 |
| 2001 | 70 | 39 |
| 2002 | 92 | 136 |
| 2003 | 133 | 140 |
| 2004 | 124 | 172 |
| 2005 | 87 | 130 |
| 2006 | 124 | 114 |
| 2007 | 67 | 106 |
| 2008 | 74 | 98 |
| 2009 | 85 | 86 |
| 2010 | 113 | 70 |
| 2011 | 84 | 40 |
| 2012 | 57 | 44 |
| 2013 | 48 | 48 |
| 2014 | 49 | 22 |
| 2015 | 29 | 44 |
| 2016 | 38 | 43 |
| 2017 | 37 | 43 |
| 2018 | 47 | 60 |
| 2019 | 40 | 57 |
| 2020 | 50 | 47 |
| 2021 | 46 | 43 |
| 2022 | 36 | 57 |
| 2023 | 25 | 40 |
| 2024 | 29 | 47 |
| 2025 | 35 | 24 |
| 2026 | 12 | 22 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Phase shift blankmask and photomask for EUV lithography23 Jun 2026US 12,663,707 B2S&S TECH Co., Ltd.
- Blank mask and photomask using the same9 Jun 2026US 12,650,640 B2LuminaMask Co., Ltd.
- Lithography mask12 May 2026US 12,625,425 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Resist pattern forming method and semiconductor device manufacturing method28 Apr 2026US 12,613,462 B2Kioxia Corporation
- Mask blank, and phase shift mask28 Apr 2026US 12,613,463 B2Hoya Corporation
- Photomask and method of manufacturing or repairing photomask1 Oct 2026US 2026/0299399 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Reflective mask blank, refelctive mask, and method for producing reflective mask17 Sep 2026US 2026/0277094 A1AGC Inc.
- Two level-set based approach for tritone attenuated phase shift masks (attpsm) and related applications10 Sep 2026US 2026/0267215 A1KLA Corporation
- Method and system for generation of lithography patterns27 Aug 2026US 2026/0251966 A1Vestlandets Innovasjonsselskap AS
- Euv mask20 Aug 2026US 2026/0244090 A1ASML Netherlands B. V.
Most cited
By later US patents
- Phase shifting circuit manufacture method and apparatus356US 5,858,580 ANumerical Technologies, Inc. · 1999
- Integrated verification and manufacturability tool308US 6,415,421 B1Mentor Graphics Corporation · 2002
- Method for designing photolithographic reticle layout, reticle, and photolithographic process228US 6,620,561 B22003
- Method for designing photolithographic reticle layout, reticle, and photolithographic process222US 6,416,907 B1Micron Technology, Inc. · 2002
- Standard cell design incorporating phase information215US 7,028,285 B2Synopsys, Inc. · 2006