G03F 1/29
Rim psm or outrigger psm
Official title: Rim PSM or outrigger PSM; Preparation thereof
G03F1/29 (Rim psm or outrigger psm) appears on 249 US grants and 106 published applications in this corpus.
Search patents in G03F- Granted patents
- 249
- Published applications
- 106
- Assignees
- 66
- Inventors
- 291
- Latest grant
- 18 Oct 2016
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 7 | 0 |
| 1994 | 18 | 0 |
| 1995 | 21 | 0 |
| 1996 | 21 | 0 |
| 1997 | 21 | 0 |
| 1998 | 22 | 0 |
| 1999 | 17 | 0 |
| 2000 | 10 | 0 |
| 2001 | 12 | 3 |
| 2002 | 9 | 13 |
| 2003 | 7 | 12 |
| 2004 | 11 | 18 |
| 2005 | 11 | 12 |
| 2006 | 11 | 15 |
| 2007 | 9 | 8 |
| 2008 | 7 | 4 |
| 2009 | 9 | 9 |
| 2010 | 7 | 5 |
| 2011 | 8 | 3 |
| 2012 | 4 | 1 |
| 2013 | 3 | 2 |
| 2014 | 0 | 0 |
| 2015 | 1 | 0 |
| 2016 | 1 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Mask for photolithography, method for fabricating the same and method for manufacturing semiconductor device using the mask18 Oct 2016US 9,470,972 B2Samsung Electronics Co., Ltd.
- Half-tone phase shift mask blank and method for manufacturing half-tone phase shift mask13 Oct 2015US 9,158,192 B2Shin-Etsu Chemical Co., Ltd.
- Chromeless phase-shifting photomask with undercut rim-shifting element26 Nov 2013US 8,591,749 B2International Business Machines Corporation
- Boundary layer formation and resultant structures18 Jun 2013US 8,465,885 B2International Business Machines Corporation
- Chromeless phase-shifting photomask with undercut rim-shifting element5 Mar 2013US 8,389,183 B2International Business Machines Corporation
- Mask for photolithography, method for fabricating the same and method for manufacturing semiconductor device using the mask21 Jan 2016US 2016/0018727 A1Samsung Electronics Co., Ltd.
- Half-tone phase shift mask blank and method for manufacturing half-tone phase shift mask21 Nov 2013US 2013/0309598 A1Shin-Etsu Chemical Co., Ltd.
- Chromeless phase-shifting photomask with undercut rim-shifting element11 Apr 2013US 2013/0089815 A1International Business Machines Corporation
- Boundary Layer Formation and Resultant Structures9 Aug 2012US 2012/0202139 A1International Business Machines Corporation
- Photomask and pattern formation method using the same27 Oct 2011US 2011/0262849 A1Panasonic Corporation
Most cited
By later US patents
- Mask for manufacturing semiconductor device and method of manufacture thereof170US 5,045,417 AHitachi, Ltd. · 1991
- Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types169US 6,994,939 B1Advanced Micro Devices, Inc. · 2006
- Inverted phase-shifted reticle136US 5,302,477 AIntel Corporation · 1994
- Method for reducing photolithographic steps in a semiconductor interconnect process85US 5,741,624 AMicron Technology, Inc. · 1998
- Simplified fabrication methods for rim phase-shift masks73US 5,532,089 AInternational Business Machines Corporation · 1996