Boundary layer formation and resultant structures

A method for forming anti-boundary layer features, the method comprising:

• patterning a first masking layer on a chrome layer;
• etching to remove portions of the chrome layer and a phase shift layer, and expose portions of a first quartz layer;
• removing the first masking layer;
• patterning a second masking layer on portions of the chrome layer and the first quartz layer;
• etching to remove exposed portions of the first quartz layer and to expose portions of an etch stop layer to define anti-boundary layers defined by the first quartz layer and the etch stop layer;
• removing the second masking layer;
• patterning a third masking layer on portions of the chrome layer and the first quartz layer;
• and
• etching to remove exposed portions of the chrome layer.

A method for forming anti-boundary layer feature, the method comprising:

• patterning a first masking layer on a chrome layer;
• etching to remove portions of the chrome layer and expose portions of a first quartz layer;
• removing the first masking layer;
• patterning a second masking layer on portions of the chrome layer and the first quartz layer;
• etching to remove exposed portions of the first quartz layer and to expose portions of a first etch stop layer to define a cavities defined by the first quartz layer and the first etch stop layer;
• patterning a third masking layer on portions of the first etch stop layer;
• etching to remove exposed portions of the first etch stop layer and a second quartz layer;
• and
• removing the third masking layer.