Chromeless phase-shifting photomask with undercut rim-shifting element
AssigneeInternational Business Machines Corporation
InventorsBrent A. Anderson, Jed H. Rankin
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Abstract
A phase-shifting photomask with a self aligned undercut rim-shifting element and methods for its manufacture are provided. One embodiment of the invention provides a method of manufacturing a phase-shifting photomask having a self aligned rim-shifting element, the method comprising: applying a patterning film to a first portion of a transparent substrate; etching the substrate to a depth to remove a second portion of the substrate not beneath the patterning film; etching the first portion of the substrate to undercut an area beneath the patterning film; and removing the patterning film, wherein the etched substrate forms a self-aligned undercut rim-shifting element.
Claims14
A method of manufacturing a phase-shifting photomask having a self aligned rim-shifting element, the method comprising:
- applying a patterning film to a first portion of a transparent substrate;
- etching the substrate to a depth to remove a second portion of the substrate not beneath the patterning film;
- etching the first portion of the substrate to undercut an area beneath the patterning film;
- and
- removing the patterning film,
- wherein the etched substrate forms a self-aligned undercut rim-shifting element.
Dependencies are inferred from the claim text.