Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types
AssigneeAdvanced Micro Devices, Inc.
InventorsKouros Ghandehari, Jean Y. Yang, Christopher A. Spence
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Abstract
A method and system of making a mask with a transparent substrate thereon is provided. A first resolution enhancement structure is formed on the first portion of the transparent substrate. A second resolution enhancement structure is formed on a second portion of the transparent substrate, with the second resolution enhancement structure different from the first resolution enhancement structure.
Claims28
A phase controlling semiconductor manufacturing resolution enhancement method comprising:
- providing a transparent substrate;
- forming a first resolution enhancement structure over a first portion of the transparent substrate;
- and
- forming a second resolution enhancement structure over a second portion of the transparent substrate, the second resolution enhancement structure different from the first resolution enhancement structure, forming the second resolution enhancement structure further comprises placing a single partially transparent film on the transparent substrate and an opaque film on the partially transparent film;
- and
- processing the opaque film to form a mask.
A phase controlling semiconductor manufacturing enhancement method comprising:
- providing a light-transparent substrate;
- forming a first resolution enhancement structure over a first portion of the light-transparent substrate;
- and
- forming a second resolution enhancement structure over a second portion of the light-transparent substrate, the second resolution enhancement structure different from the first resolution enhancement structure, the second resolution enhancement structure using a single partially light-transparent film on the light-transparent substrate and an opaque film on the partially light-transparent film;
- and
- processing the opaque film to form a patterned mask.
A phase controlling semiconductor manufacturing resolution enhancement system comprising:
- a transparent substrate;
- a first resolution enhancement structure over a first portion of the transparent substrate;
- and
- a second resolution enhancement structure over a second portion of the transparent substrate, the second resolution enhancement structure different from the first resolution enhancement structure, the second resolution enhancement structure has a single partially transparent film on the transparent substrate and an opaque film on the partially transparent film;
- and
- the transparent substrate, the first resolution enhancement structure, and the second resolution enhancement structure form a mask.
A phase controlling semiconductor manufacturing enhancement system comprising:
- a light-transparent substrate;
- a first resolution enhancement structure over a first portion of the light-transparent substrate;
- and
- a second resolution enhancement structure over a second portion of the light-transparent substrate, the second resolution enhancement structure different from the first resolution enhancement structure, the second resolution enhancement structure has a single partial light-transparent film on the light-transparent substrate and an opaque film on the partially light-transparent film;
- and
- the light-transparent substrate, the first resolution enhancement structure, and the second resolution enhancement structure from a patterned mask.
Dependencies are inferred from the claim text.