TWO LEVEL-SET BASED APPROACH FOR TRITONE ATTENUATED PHASE SHIFT MASKS (attPSM) AND RELATED APPLICATIONS
AssigneeKLA Corporation
InventorsYing He, Changqing Hu, Vikram Tolani, Lu Yu, Zeyu Lei
Life of this patent
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AssigneeKLA Corporation
InventorsYing He, Changqing Hu, Vikram Tolani, Lu Yu, Zeyu Lei
Estimating the term…
Methods and systems for determining information for a photomask are provided. One method includes determining tone of a photomask as a function of position on the photomask by applying predefined rules to reference data for the photomask when multiple level sets of the photomask overlap. The photomask has three or more tones, and the multiple level sets include three or more definitions for the three or more tones, respectively. The method also includes determining information for the photomask from the determined tone as the function of the position on the photomask. The embodiments described herein provide particular advantages as a two level-set based approach for lithography modeling of tritone attenuated phase shift masks (attPSMs) and related applications of automatic defect classification (ADC) and lithography plane review (LPR) in photomask inspection.
A system configured for determining information for a photomask, comprising:
A non-transitory computer-readable medium, storing program instructions executable on a computer system for performing a computer-implemented method for determining information for a photomask, wherein the computer-implemented method comprises:
A computer-implemented method for determining information for a photomask, comprising:
Dependencies are inferred from the claim text.