G03F 1/32
Attenuating psm [att-psm]
Official title: Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion,; Preparation thereof
G03F1/32 (Attenuating psm [att-psm]) appears on 941 US grants and 866 published applications in this corpus.
Search patents in G03F- Granted patents
- 941
- Published applications
- 866
- Assignees
- 201
- Inventors
- 1,192
- Latest grant
- 9 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 3 | 0 |
| 1995 | 14 | 0 |
| 1996 | 25 | 0 |
| 1997 | 33 | 0 |
| 1998 | 42 | 0 |
| 1999 | 34 | 0 |
| 2000 | 31 | 0 |
| 2001 | 34 | 22 |
| 2002 | 41 | 56 |
| 2003 | 47 | 43 |
| 2004 | 41 | 76 |
| 2005 | 32 | 54 |
| 2006 | 52 | 55 |
| 2007 | 27 | 63 |
| 2008 | 31 | 46 |
| 2009 | 47 | 42 |
| 2010 | 57 | 37 |
| 2011 | 51 | 23 |
| 2012 | 28 | 21 |
| 2013 | 23 | 18 |
| 2014 | 19 | 7 |
| 2015 | 12 | 19 |
| 2016 | 13 | 20 |
| 2017 | 12 | 18 |
| 2018 | 23 | 36 |
| 2019 | 24 | 30 |
| 2020 | 27 | 27 |
| 2021 | 28 | 24 |
| 2022 | 22 | 43 |
| 2023 | 16 | 27 |
| 2024 | 16 | 35 |
| 2025 | 25 | 15 |
| 2026 | 8 | 9 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Blank mask and photomask using the same9 Jun 2026US 12,650,640 B2LuminaMask Co., Ltd.
- Lithography mask12 May 2026US 12,625,425 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Resist pattern forming method and semiconductor device manufacturing method28 Apr 2026US 12,613,462 B2Kioxia Corporation
- Mask blank, and phase shift mask28 Apr 2026US 12,613,463 B2Hoya Corporation
- Laminate for blank mask and manufacturing method for the same20 Jan 2026US 12,529,951 B2SK enpulse Co., Ltd.
- Photomask and method of manufacturing or repairing photomask1 Oct 2026US 2026/0299399 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Two level-set based approach for tritone attenuated phase shift masks (attpsm) and related applications10 Sep 2026US 2026/0267215 A1KLA Corporation
- Phase-shifting photomask16 Jul 2026US 2026/0202734 A1Powerchip Semiconductor Manufacturing Corporation
- Reflective photomask, reflective photomask blank, and method for manufacturing reflective photomask18 Jun 2026US 2026/0169368 A1Shin-Etsu Chemical Co., Ltd.
- Reflective Photomask, Reflective Photomask Blank, and Method for Manufacturing Reflective Photomask18 Jun 2026US 2026/0169369 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Sputter deposition of hydrogenated amorphous carbon film and applications thereof199US 5,830,332 AInternational Business Machines Corporation · 1998
- Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types169US 6,994,939 B1Advanced Micro Devices, Inc. · 2006
- Reticle and optical proximity correction method133US 7,527,900 B2United Microelectronics Corp. · 2009
- Orthogonally separated phase shifted and unphase shifted mask patterns for image improvement110US 5,472,814 AInternational Business Machines Corporation · 1995
- System and method for printing semiconductor patterns using an optimized illumination and reticle108US 6,563,566 B2International Business Machines Corporation · 2003