Laminate for blank mask and manufacturing method for the same

A manufacturing method of a laminate for a blank mask comprising:

• forming a phase shift film on a light-transmitting layer;
• thermally treating the phase shift film;
• and
• cleaning the thermally treated phase shift film,
• wherein the forming of the phase shift film comprises a nitrogen treatment operation of applying a gas having 30 volume % to 70 volume % of nitrogen gas and maintaining a concentration of ammonium ions of a surface of the phase shift film at 50 ng/cm2 to 110 ng/cm2,
• wherein the cleaning of the thermally treated phase shift film comprises a first cleaning process of adding UV rays and ozone water to the thermally treated phase shift film, and a second cleaning process of adding carbonated water and hydrogen water to the phase shift film of the first cleaning process,
• wherein residual ions measured from the surface of the phase shift film after the cleaning of the thermally treated phase shift film comprise
• at least any one of sulfate ions in a concentration of 0 ng/cm2 to 0.05 ng/cm2,
• nitric oxide ions in a concentration of 0 ng/cm2 to 0.5 ng/cm2, or
• ammonium ions in a concentration of 0 ng/cm2 to 5 ng/cm2, or any combination thereof, and
• wherein a sum of concentrations of the residual ions is more than 0.

A laminate for manufacturing a blank mask comprising,

• a light-transmitting layer;
• and
• a phase shift film disposed on the light-transmitting layer,
• wherein residual ions measured from a surface of the phase shift film through ion chromatography comprise
• either one or both of sulfate ions in a concentration of 0 ng/cm2 to 0.05 ng/cm2 and
• nitric oxide ions in a concentration of 0 ng/cm2 to 2 ng/cm2, and
• comprise ammonium ions in a concentration of 50 ng/cm2 to 110 ng/cm2, and
• wherein a sum of concentrations of the sulfate ions and the nitric oxide ions is more than 0.