G03F 1/28
With three or more diverse phases on the same psm
Official title: with three or more diverse phases on the same PSM; Preparation thereof
G03F1/28 (With three or more diverse phases on the same psm) appears on 130 US grants and 74 published applications in this corpus.
Search patents in G03F- Granted patents
- 130
- Published applications
- 74
- Assignees
- 63
- Inventors
- 195
- Latest grant
- 1 Dec 2020
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 5 | 0 |
| 1994 | 6 | 0 |
| 1995 | 5 | 0 |
| 1996 | 6 | 0 |
| 1997 | 6 | 0 |
| 1998 | 6 | 0 |
| 1999 | 5 | 0 |
| 2000 | 4 | 0 |
| 2001 | 6 | 0 |
| 2002 | 4 | 2 |
| 2003 | 3 | 3 |
| 2004 | 4 | 3 |
| 2005 | 3 | 6 |
| 2006 | 4 | 12 |
| 2007 | 5 | 4 |
| 2008 | 7 | 6 |
| 2009 | 6 | 4 |
| 2010 | 10 | 2 |
| 2011 | 1 | 1 |
| 2012 | 3 | 3 |
| 2013 | 2 | 5 |
| 2014 | 7 | 5 |
| 2015 | 3 | 5 |
| 2016 | 9 | 5 |
| 2017 | 3 | 1 |
| 2018 | 2 | 3 |
| 2019 | 3 | 2 |
| 2020 | 2 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 0 |
| 2024 | 0 | 0 |
| 2025 | 0 | 1 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Phase shifter mask1 Dec 2020US 10,852,634 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Photomask and methods for manufacturing and correcting photomask28 Apr 2020US 10,634,990 B2Dai Nippon Printing Co.Ltd.
- Photomask and methods for manufacturing and correcting photomask27 Aug 2019US 10,394,118 B2Dai Nippon Printing Co.Ltd.
- Photomask and a fabrication method therefor9 Jul 2019US 10,345,692 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Photomask including transfer patterns for reducing a thermal stress2 Jul 2019US 10,338,464 B2SK hynix Inc.
- Phase-shifting photomask16 Jul 2026US 2026/0202734 A1Powerchip Semiconductor Manufacturing Corporation
- Photomask blank, and method for manufacturing photomask20 Nov 2025US 2025/0355343 A1Shin-Etsu Chemical Co., Ltd.
- Phase shifter mask31 Oct 2019US 2019/0332003 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Photomask and methods for manufacturing and correcting photomask31 Oct 2019US 2019/0332006 A1Dai Nippon Printing Co.Ltd.
- Photomask and methods for manufacturing and correcting photomask8 Nov 2018US 2018/0321582 A1Dai Nippon Printing Co.Ltd.
Most cited
By later US patents
- Systematic method for production of phase-shifting photolithographic masks139US 5,527,645 A1996
- Method for designing phase-shifting masks with automatization capability125US 5,538,815 AKabushiki Kaisha Toshiba · 1996
- Phase-shifting mask for equal line/space dense line patterns105US 7,504,184 B2Nanya Technology Corporation · 2009
- Mask having an arbitrary complex transmission function51US 6,197,456 B1LSI Logic Corporation · 2001
- Phase shifting reticle fabrication using ion implantation49US 5,208,125 AMicron Technology, Inc. · 1993