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US 2019/0332003 A1Published application
Phase shifter mask
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChun-Lang CHEN, Chih-Chiang TU, Shih-Hao YANG
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Abstract
A phase shift mask (PSM) includes a light transmitting substrate. The PSM further includes a phase shifter over the light transmitting substrate, wherein the phase shifter includes a plurality of semiconductor layers and a plurality of dielectric layers stacked in an alternating fashion.
Claims20
A phase shift mask (PSM), comprising:
- a light transmitting substrate;
- and
- a phase shifter over the light transmitting substrate, wherein the phase shifter comprises a plurality of semiconductor layers and a plurality of dielectric layers stacked in an alternating fashion.
A phase shift mask (PSM), comprising:
- a light transmitting substrate;
- a phase shifter over the light transmitting substrate, wherein the phase shifter comprising a first semiconductor layer, at least one pair of a first dielectric layer and a second semiconductor layer over the first semiconductor layer, and a second dielectric layer over the at least one pair of the first dielectric layer and the second semiconductor layer;
- and
- a shading layer over the phase shifter.
1 more element
A phase shift mask (PSM), comprising:
- a light transmitting substrate;
- a plurality of phase shifter stacks over the light transmitting substrate, wherein each of the plurality of phase shifter stacks comprises a plurality of semiconductor layers and a plurality of dielectric layers stacked in an alternating fashion;
- and
- a plurality of openings, wherein adjacent phase shifter stacks of the plurality of phase shifter stacks define a corresponding opening of the plurality of openings.
1 more element
Dependencies are inferred from the claim text.