G03F 1/30
Alternating psm
Official title: Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
G03F1/30 (Alternating psm) appears on 656 US grants and 435 published applications in this corpus.
Search patents in G03F- Granted patents
- 656
- Published applications
- 435
- Assignees
- 144
- Inventors
- 817
- Latest grant
- 6 Jan 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 14 | 0 |
| 1994 | 26 | 0 |
| 1995 | 29 | 0 |
| 1996 | 29 | 0 |
| 1997 | 26 | 0 |
| 1998 | 22 | 0 |
| 1999 | 37 | 0 |
| 2000 | 20 | 0 |
| 2001 | 24 | 12 |
| 2002 | 27 | 59 |
| 2003 | 62 | 52 |
| 2004 | 56 | 59 |
| 2005 | 27 | 47 |
| 2006 | 50 | 41 |
| 2007 | 22 | 31 |
| 2008 | 31 | 32 |
| 2009 | 24 | 17 |
| 2010 | 37 | 14 |
| 2011 | 14 | 9 |
| 2012 | 11 | 6 |
| 2013 | 6 | 9 |
| 2014 | 9 | 5 |
| 2015 | 9 | 8 |
| 2016 | 10 | 4 |
| 2017 | 3 | 4 |
| 2018 | 4 | 6 |
| 2019 | 5 | 2 |
| 2020 | 6 | 6 |
| 2021 | 1 | 2 |
| 2022 | 4 | 4 |
| 2023 | 3 | 1 |
| 2024 | 1 | 2 |
| 2025 | 3 | 2 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Photolithography method and apparatus6 Jan 2026US 12,517,437 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Phase shift mask for EUV lithography and manufacturing method for the phase shift mask11 Nov 2025US 12,468,216 B2SK hynix Inc.
- Semiconductor device23 Sep 2025US 12,423,498 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography mask and methods22 Jul 2025US 12,366,798 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Phase shift mask for EUV lithography and manufacturing method for the phase shift mask2 Jul 2024US 12,025,912 B2SK hynix Inc.
- Photolithography method and apparatus16 Apr 2026US 2026/0104644 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Lithography mask and methods16 Oct 2025US 2025/0321477 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor device16 Oct 2025US 2025/0322135 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Mask blank, phase shift mask, and method for producing semiconductor device10 Oct 2024US 2024/0337919 A1Hoya Corporation
- Phase shift mask for euv lithography and manufacturing method for the phase shift mask19 Sep 2024US 2024/0310717 A1SK hynix Inc.
Most cited
By later US patents
- Phase shifting circuit manufacture method and apparatus356US 5,858,580 ANumerical Technologies, Inc. · 1999
- Standard cell design incorporating phase information215US 7,028,285 B2Synopsys, Inc. · 2006
- Phase shift masking for complex patterns with proximity adjustments213US 7,132,203 B2Synopsys, Inc. · 2006
- Generating mask patterns for alternating phase-shift mask lithography210US 6,993,741 B2International Business Machines Corporation · 2006
- Design data format and hierarchy management for phase processing201US 6,978,436 B2Synopsys, Inc. · 2005