G01B 11/0616
Of coating
Official title: {of coating}
G01B11/0616 (Of coating) appears on 2,104 US grants and 1,968 published applications in this corpus.
Search patents in G01B- Granted patents
- 2,104
- Published applications
- 1,968
- Assignees
- 906
- Inventors
- 4,215
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 3 | 0 |
| 1978 | 5 | 0 |
| 1979 | 5 | 0 |
| 1980 | 8 | 0 |
| 1981 | 4 | 0 |
| 1982 | 4 | 0 |
| 1983 | 5 | 0 |
| 1984 | 6 | 0 |
| 1985 | 10 | 0 |
| 1986 | 9 | 0 |
| 1987 | 20 | 0 |
| 1988 | 9 | 0 |
| 1989 | 16 | 0 |
| 1990 | 23 | 0 |
| 1991 | 17 | 0 |
| 1992 | 15 | 0 |
| 1993 | 17 | 0 |
| 1994 | 26 | 0 |
| 1995 | 28 | 0 |
| 1996 | 21 | 0 |
| 1997 | 27 | 0 |
| 1998 | 36 | 0 |
| 1999 | 44 | 0 |
| 2000 | 42 | 0 |
| 2001 | 41 | 13 |
| 2002 | 34 | 56 |
| 2003 | 68 | 57 |
| 2004 | 69 | 76 |
| 2005 | 47 | 80 |
| 2006 | 79 | 82 |
| 2007 | 76 | 85 |
| 2008 | 78 | 56 |
| 2009 | 59 | 63 |
| 2010 | 67 | 73 |
| 2011 | 34 | 57 |
| 2012 | 53 | 62 |
| 2013 | 43 | 65 |
| 2014 | 62 | 70 |
| 2015 | 56 | 66 |
| 2016 | 58 | 67 |
| 2017 | 63 | 59 |
| 2018 | 55 | 99 |
| 2019 | 74 | 103 |
| 2020 | 87 | 109 |
| 2021 | 98 | 117 |
| 2022 | 96 | 106 |
| 2023 | 83 | 102 |
| 2024 | 82 | 91 |
| 2025 | 89 | 85 |
| 2026 | 49 | 69 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G01B 11/0625With measurement of absorption or reflection846
- G01B 11/0675Using interferometry386
- G01B 11/0683Measurement during deposition or removal of the layer361
- G01B 11/0641With measurement of polarization329
- G01B 11/0658With measurement of emissivity or reradiation102
- G01B 11/0666Using an exciting beam and a detection beam including surface acoustic waves68
Recent patents
- Film thickness measuring device and film thickness measuring method22 Sep 2026US 12,742,637 B2Hamamatsu Photonics K.K.
- Film thickness measurement device and film thickness measurement method15 Sep 2026US 12,736,327 B2Hamamatsu Photonics K.K.
- Thickness-distribution measurement device and thickness-distribution measurement method8 Sep 2026US 12,729,951 B2Hamamatsu Photonics K.K.
- Second harmonic generation (SHG) measurement device and measurement method using the same1 Sep 2026US 12,723,863 B2Samsung Electronics Co., Ltd.
- Method for analyzing thin film and device for analyzing thin film25 Aug 2026US 12,716,709 B2Samsung Display Co., Ltd.
- Optical thin film analysis apparatus not affected by substrate back surface reflection and analysis method thereof8 Oct 2026US 2026/0309623 A1
- Apparatus and methods for discovery, optimization, selection, and synthesis of high-efficiency transparent opv donor-acceptor pairs1 Oct 2026US 2026/0305153 A1
- Method of Characterizing Layer Thickness24 Sep 2026US 2026/0287328 A13M Innovative Properties Company
- Measurement processing apparatus, measurement method, and storage medium24 Sep 2026US 2026/0287329 A1Otsuka Electronics Co., Ltd.
- Light irradiation apparatus, measuring apparatus, observation apparatus, and film thickness measuring apparatus24 Sep 2026US 2026/0287877 A1Hamamatsu Photonics K.K.
Most cited
By later US patents
- In-situ endpoint detection and process monitoring method and apparatus for chemical-mechanical polishing472US 5,433,651 AInternational Business Machines Corporation · 1995
- Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus396US 5,893,796 AAPPLIED Materials.Inc. · 1999
- Method and apparatus for measuring reflectance in two wavelength bands to enable determination of thin film thickness321US 5,486,701 APrometrix Corporation · 1996
- Apparatus and method for in-situ monitoring of chemical mechanical polishing operations261US 5,964,643 AAPPLIED Materials.Inc. · 1999
- Optical system and method for angle-dependent reflection or transmission measurement255US 5,889,593 AKLA Instruments Corporation · 1999