Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
AssigneeApplied Materials, Inc.
InventorsManoocher Birang, Allan Gleason, William L. Guthrie
Life of this patent
Estimating the term…
Abstract
The polishing pad for a chemical mechanical polishing apparatus and a method of making the same. The polishing pad has a covering lawyer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.
Claims18
A polishing pad for a chemical mechanical polishing apparatus, comprising:
- an article having a polishing surface;
- an aperture formed in this article, the aperture including a first section with a first dimension and a second section with a second, different dimension;
- and
- a substantially transparent plug secured in the aperture and having a first portion positioned in the first section of the aperture and a second portion positioned in the second section of the aperture.
A polishing pad for a chemical mechanical polishing apparatus, comprising:
- a first layer having a polishing surface;
- a second layer adjacent to the first layer;
- an aperture through the first and second layers, the aperture including a first opening in the first layer with a first cross-sectional area and a second opening in the second layer with a second, smaller cross-sectional area;
- a substantially transparent plug positioned in the aperture, the plug having a first portion positioned in the first opening in the first layer and a second portion positioned in the second opening in the second layer;
- and
- an adhesive material fixing the plug in the aperture.
A method of forming a polishing pad, comprising the steps of:
- forming an aperture in a polishing pad such that the aperture includes a first section with a first dimension and a second section with a second, different dimension;
- placing a substantially transparent plug in the aperture, with the plug having a first portion positioned in the first section of the aperture and a second portion positioned in the second section of the aperture;
- and
- securing the plug in the aperture.
Dependencies are inferred from the claim text.