Measurement processing apparatus, measurement method, and storage medium
AssigneeOtsuka Electronics Co., Ltd.
InventorsSota OKAMOTO, Koichi MORIMOTO, Yoshimi SAWAMURA, Takao WADA
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AssigneeOtsuka Electronics Co., Ltd.
InventorsSota OKAMOTO, Koichi MORIMOTO, Yoshimi SAWAMURA, Takao WADA
Estimating the term…
A measurement processing apparatus obtains a spectrum of observed light produced from a sample as the sample is irradiated with measurement light, extracts, as a candidate group, one or more data sets each including a spectrum similar to the spectrum of the observed light, with regard to each of the one or more data sets in the candidate group, fits parameters of a model formula determined based on the film model in the data set so that a spectrum calculated based on the model formula matches the spectrum of the observed light, and determines a film thickness of each layer of the sample based on one or more of measurement results calculated for the data sets in the candidate group.
A measurement processing apparatus configured to perform operations comprising:
A measurement method comprising:
A non-transitory computer-readable storage medium storing instructions that, when executed by one or more processors, cause the one or more processors to perform the operations comprising:
Dependencies are inferred from the claim text.