Optical thin film analysis apparatus not affected by substrate back surface reflection and analysis method thereof
OwnerChang Soo JUNGinventor
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Abstract
An optical thin film analysis apparatus not affected by substrate back surface reflection, including: a light source emitting beam; a substrate with a thin film through which the beam emitted from the light source is transmitted; a multiple-beam separator positioned between the light source and the substrate with a thin film and spatially separating the multiple beams transmitted through the substrate with a thin film; a beam filter passing one beam of the multiple beams transmitted through the substrate with a thin film and blocking the other beams; and a photodetector receiving the beam passed by the beam filter.
Claims26
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An optical thin film analysis apparatus not affected by substrate back surface reflection, comprising:
- a light source emitting beam;
- a substrate with a thin film through which the beam emitted from the light source is transmitted;
- a multiple-beam separator positioned between the light source and the substrate with a thin film and spatially separating the multiple beams transmitted through the substrate with a thin film;
- a beam filter passing one beam of the multiple beams transmitted through the substrate with a thin film and blocking the other beams;
- and
- a photodetector receiving the beam passed by the beam filter.
An optical thin film analysis apparatus not affected by substrate back surface reflection, comprising:
- a light source emitting beam;
- a substrate with a thin film through which the beam emitted from the light source is transmitted;
- a multiple-beam separator positioned between the light source and the substrate with a thin film and spatially separating the multiple beams transmitted through the substrate with a thin film;
- a beam-deviation compensator compensating for deviation and separation of the multiple beams transmitted through the substrate with a thin film;
- and
- a photodetector receiving the multiple beams whose deviation and separation are compensated for by the beam-deviation compensator.
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Dependencies are inferred from the claim text.