Method for analyzing thin film and device for analyzing thin film

A method for analyzing a thin film, the method comprising:

• preparing a main sample in which a first layer and a second layer, which are composed of a plurality of materials, are stacked, and a plurality of comparative samples composed of a plurality of materials substantially the same as the materials of the main sample, wherein one of the plurality of materials is a comparative material having a different amount of material compared to the main sample;
• measuring a total thickness of the main sample;
• measuring optical constants of the main sample and the comparative samples;
• deriving a linear relation equation representing a linear relation between each of the optical constants of the main sample and the comparative samples and the material amount of the main sample and a corresponding one of the comparative materials among the comparative samples;
• and
• calculating a material composition ratio of the main sample based on the linear relation equation and the material amount of a material corresponding to the comparative material among the plurality of materials of the main sample.

A device for analyzing a thin film, the device comprising:

• a measuring unit disposed on a sample stage and configured to measure a total thickness of a sample land an optical constant of the sample;
• a memory unit configured to store data on an optical constant of an auxiliary sample substantially the same as the sample;
• and
• a calculation unit configured to receive a value of the total thickness of the sample and the optical constant of the sample measured by the measuring unit, and the stored data from the memory unit and calculate a thickness of each of a plurality of thin film layers included in the sample,
• wherein the memory unit further stores a relation between a material amount and the optical constant, a relation between the material amount and a material composition ratio, and a relation between the material amount and a layer thickness.