Film thickness measurement device and film thickness measurement method
AssigneeHamamatsu Photonics K.K.
InventorsKunihiko Tsuchiya, Satoshi Arano, Kenichi Ohtsuka
Life of this patent
Estimating the term…
Abstract
A film thickness measurement apparatus includes a light source that irradiates a sample with light, an area sensor that detects light from the sample and outputs a signal according to luminance information of the detected light, a spectrometer that spectrally detects light from the sample and outputs a signal according to wavelength information including a spectrum of the light, and a control apparatus that estimates a film thickness of the sample on the basis of the luminance information specified from the signal output from the area sensor and the wavelength information specified from the signal output from the spectrometer.
Claims15
A film thickness measurement apparatus comprising:
- a light source configured to irradiate an object to be measured with light;
- a light detector including i) a first light detector being a first area sensor or a first line sensor detecting light from the object to be measured and ii) a second light detector being a second area sensor or a second line sensor, and configured to output a signal according to luminance information of the detected light, wherein the luminance information includes a ratio between a luminance value of light detected by the first light detector and a luminance value of light detected by the second light detector;
- a spectrometer configured to spectrally detect light from the object to be measured and output a signal according to wavelength information including a spectrum of the light, the wavelength information includes information indicating an intensity of the light for each wavelength of a plurality of wavelengths;
- and
- a controller configured to estimate a film thickness of the object to be measured based on both i) the luminance information specified from the signal output from the light detector and ii) the wavelength information specified from the signal output from the spectrometer,
- wherein estimating the film thickness of the object includes i) obtaining a relative distribution of a film thickness based on the luminance information, ii) obtaining an absolute value of the film thickness at a specific point of the spectrum of the light, and iii) deriving an absolute value of the film thickness of an entire area of the object to be measured based on the obtained relative film thickness distribution and the obtained absolute value of the film thickness.
A film thickness measurement method comprising:
- irradiating an object to be measured with light;
- detecting, with a light detector, light from the object to be measured and outputting a signal according to luminance information of the detected light, wherein the light detector includes i) a first light detector being a first area sensor or a first line sensor detecting light from the object to be measured and ii) a second light detector being a second area sensor or a second line sensor, and the luminance information includes a ratio between a luminance value of light detected by the first light detector and a luminance value of light detected by the second light detector;
- spectrally detecting, with a spectrometer, light from the object to be measured and outputting a signal according to wavelength information including a spectrum of the light, the wavelength information includes information indicating an intensity of the light for each wavelength of a plurality of wavelengths;
- and
- estimating a film thickness of the object to be measured based on both i) the luminance information specified from the signal output in detecting light from the object to be measured and outputting the signal according to luminance information of the detected light and ii) the wavelength information specified from the signal output in spectrally detecting light from the object to be measured and outputting the signal according to wavelength information including a spectrum of the light,
- wherein estimating the film thickness of the object includes i) obtaining a relative distribution of a film thickness based on the luminance information, ii) obtaining an absolute value of the film thickness at a specific point of the spectrum of the light, and iii) deriving an absolute value of the film thickness of an entire area of the object to be measured based on the obtained relative film thickness distribution and the obtained absolute value of the film thickness.
A film thickness measurement method comprising:
- irradiating an object to be measured with light;
- detecting light from the object to be measured and outputting a signal according to luminance information of the detected light, wherein in detecting light, the light from the object to be measured is divided, and the luminance information is acquired by detecting each of the divided light;
- spectrally detecting light from the object to be measured and outputting a signal according to wavelength information including a spectrum of the light;
- determining whether or not to perform film thickness estimation of the object to be measured using the luminance information and the wavelength information based on information of the object to be measured;
- and
- estimating, when it is determined to perform film thickness estimation of the object to be measured using the luminance information and the wavelength information, a film thickness of the object to be measured based on the luminance information specified from the signal output in detecting light from the object to be measured and outputting the signal according to luminance information of the detected light and the wavelength information specified from the signal output in spectrally detecting light from the object to be measured and outputting the signal according to wavelength information including a spectrum of the light,
- wherein estimating the film thickness of the object includes i) obtaining a relative distribution of a film thickness based on the luminance information, ii) obtaining an absolute value of the film thickness at a specific point of the spectrum of the light, and iii) deriving an absolute value of the film thickness of an entire area of the object to be measured based on the obtained relative film thickness distribution and the obtained absolute value of the film thickness.
Dependencies are inferred from the claim text.