C23C 14/545
Using measurement on deposited material
Official title: {using measurement on deposited material}
C23C14/545 (Using measurement on deposited material) appears on 335 US grants and 430 published applications in this corpus.
Search patents in C23C- Granted patents
- 335
- Published applications
- 430
- Assignees
- 269
- Inventors
- 1,138
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 2 | 0 |
| 1978 | 2 | 0 |
| 1979 | 1 | 0 |
| 1980 | 4 | 0 |
| 1981 | 1 | 0 |
| 1982 | 3 | 0 |
| 1983 | 2 | 0 |
| 1984 | 0 | 0 |
| 1985 | 4 | 0 |
| 1986 | 7 | 0 |
| 1987 | 5 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 5 | 0 |
| 1991 | 0 | 0 |
| 1992 | 4 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 4 | 0 |
| 1998 | 3 | 0 |
| 1999 | 7 | 0 |
| 2000 | 10 | 0 |
| 2001 | 3 | 4 |
| 2002 | 12 | 22 |
| 2003 | 17 | 13 |
| 2004 | 11 | 13 |
| 2005 | 11 | 15 |
| 2006 | 4 | 12 |
| 2007 | 6 | 14 |
| 2008 | 6 | 13 |
| 2009 | 3 | 16 |
| 2010 | 3 | 15 |
| 2011 | 6 | 12 |
| 2012 | 10 | 10 |
| 2013 | 4 | 10 |
| 2014 | 9 | 17 |
| 2015 | 8 | 14 |
| 2016 | 11 | 26 |
| 2017 | 10 | 17 |
| 2018 | 8 | 20 |
| 2019 | 15 | 22 |
| 2020 | 11 | 13 |
| 2021 | 18 | 23 |
| 2022 | 13 | 25 |
| 2023 | 16 | 22 |
| 2024 | 25 | 37 |
| 2025 | 16 | 20 |
| 2026 | 6 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Tubular sputter cathode29 Sep 2026US 12,747,491 B2BüHler Alzenau GmbH
- Cylindric decomposition for efficient mitigation of substrate deformation with film deposition and ion implantation29 Sep 2026US 12,751,253 B2APPLIED Materials.Inc.
- Film formation control device, film formation device and film formation method14 Jul 2026US 12,680,157 B2Shincron Co., Ltd.
- Anti-stick coatings including fluorophores19 May 2026US 12,629,198 B2Gyrus ACMI, Inc.
- Consumable component treating apparatus and semiconductor manufacturing equipment19 May 2026US 12,630,918 B2Semes Co., Ltd.
- PVD Device with Adjustable Rotation Radius of Magnetron and Source Power Applied to Planar Target and Application Method Thereof17 Sep 2026US 2026/0275499 A1Arrayed Materials (China) Co., Ltd.
- Crystal sensor and thin-film deposition device including the same10 Sep 2026US 2026/0265902 A1Samsung Display Co., Ltd.
- Quantifying film accumulation on an insulating surface in semiconductor processing equipment6 Aug 2026US 2026/0229451 A1
- Method, control device, computer program and storage medium30 Apr 2026US 2026/0117367 A1Von Ardenne Asset GmbH & Co. KG
- Deposition apparatus5 Feb 2026US 2026/0035781 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Method and system for adjusting semiconductor processing equipment412US 6,126,744 AASM America, Inc. · 2000
- Ellipsometric control of material growth168US 5,091,320 ABell Communications Research, Inc. · 1992
- Cell control method and apparatus96US 6,161,054 AOn-Line Technologies, Inc. · 2000
- Systems and methods of monitoring thin film deposition80US 6,651,488 B2Agilent Technologies, Inc. · 2003
- Systems and methods of monitoring thin film deposition72US 6,668,618 B2Agilent Technologies, Inc. · 2003