PVD Device with Adjustable Rotation Radius of Magnetron and Source Power Applied to Planar Target and Application Method Thereof

A physical vapor deposition (PVD) device with adjustable rotation radius of magnetron and source power of a planar target configured to form a film on a substrate, the device comprising:

• a planar target;
• a magnetron rotating assembly, comprising a magnetron, a magnetron bracket, a magnetron guide rail and a magnetron slider, wherein the magnetron is slidably connected to the magnetron bracket via the magnetron guide rail and the magnetron slider, and wherein a projection area of the magnetron on a horizontal plane is smaller than a projection area of the planar target on the horizontal plane;
• a drive mechanism, comprising a first drive unit and a second drive unit, wherein the first drive unit is configured to drive the magnetron bracket to rotate around a first axis, such that the magnetron rotates relative to the planar target along a circumferential trajectory, and the second drive unit is configured to drive the magnetron to move radially relative to the magnetron bracket, thereby adjusting a rotation radius of the circumferential trajectory;
• and
• a controller configured to perform at least one of the following control logics:
• controlling the second drive unit to drive the magnetron to move radially, such that the film is formed with a thickness within a set thickness range;
• or
• controlling a source power applied to the planar target, such that the film is formed with a resistivity within a set resistivity range.