C11D 7/5013
Containing nitrogen
Official title: {containing nitrogen}
C11D7/5013 (Containing nitrogen) appears on 299 US grants and 234 published applications in this corpus.
Search patents in C11D- Granted patents
- 299
- Published applications
- 234
- Assignees
- 174
- Inventors
- 616
- Latest grant
- 16 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 2 | 0 |
| 1978 | 3 | 0 |
| 1979 | 2 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 2 | 0 |
| 1984 | 5 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 3 | 0 |
| 1988 | 5 | 0 |
| 1989 | 1 | 0 |
| 1990 | 3 | 0 |
| 1991 | 3 | 0 |
| 1992 | 5 | 0 |
| 1993 | 7 | 0 |
| 1994 | 8 | 0 |
| 1995 | 8 | 0 |
| 1996 | 6 | 0 |
| 1997 | 13 | 0 |
| 1998 | 11 | 0 |
| 1999 | 16 | 0 |
| 2000 | 8 | 0 |
| 2001 | 16 | 10 |
| 2002 | 10 | 26 |
| 2003 | 18 | 11 |
| 2004 | 12 | 22 |
| 2005 | 10 | 16 |
| 2006 | 15 | 8 |
| 2007 | 5 | 7 |
| 2008 | 7 | 8 |
| 2009 | 4 | 4 |
| 2010 | 8 | 2 |
| 2011 | 1 | 8 |
| 2012 | 5 | 7 |
| 2013 | 3 | 6 |
| 2014 | 5 | 6 |
| 2015 | 8 | 5 |
| 2016 | 4 | 8 |
| 2017 | 4 | 8 |
| 2018 | 9 | 6 |
| 2019 | 5 | 11 |
| 2020 | 7 | 6 |
| 2021 | 7 | 4 |
| 2022 | 1 | 9 |
| 2023 | 5 | 13 |
| 2024 | 3 | 9 |
| 2025 | 7 | 7 |
| 2026 | 5 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Metal residue removing liquid, metal residue removing method, and metal wiring manufacturing method16 Jun 2026US 12,655,370 B2Tokyo Ohka Kogyo.Co., Ltd.
- Cleaning agent composition and cleaning method12 May 2026US 12,624,318 B2Nissan Chemical Corporation
- Composition, and method for cleaning adhesive polymer17 Mar 2026US 12,577,508 B2Resonac Corporation
- Method for cleaning semiconductor substrate, method for producing processed semiconductor substrate, and stripping composition10 Feb 2026US 12,545,863 B2Nissan Chemical Corporation
- Semiconductor substrate cleaning method, processed semiconductor substrate manufacturing method, and composition for peeling27 Jan 2026US 12,534,693 B2Nissan Chemical Corporation
- Solvent-based compositions for post-etch residue removal and related methods27 Aug 2026US 2026/0250607 A1Entegris, Inc.
- Cleaning composition for organic and inorganic materials, method for cleaning using the same and electronic device manufactured using the same16 Jul 2026US 2026/0201282 A1Poong Won Chemical Co., Ltd.
- Solvent composition16 Jul 2026US 2026/0201283 A1
- Cleaning composition2 Apr 2026US 2026/0092239 A1Dongwoo Fine-Chem Co., Ltd.
- Cleaning method12 Mar 2026US 2026/0071152 A1Nissan Chemical Corporation
Most cited
By later US patents
- Cleaning compositions for removing etching residue and method of using150US 5,334,332 AEKC Technology, Inc. · 1994
- Post clean treatment composition comprising an organic acid and hydroxylamine137US 5,981,454 AEKC Technology, Inc. · 1999
- Washing apparatus126US 6,691,536 B2The Procter & Gamble Company · 2004
- Stripping composition and method of using the same114US 4,617,251 AOlin Hunt Specialty Products Inc. · 1986
- Stripping compositions comprising hydroxylamine and alkanolamine89US 5,279,771 AEKC Technology, Inc. · 1994