C11D 7/50
Solvents
C11D7/50 (Solvents) appears on 1,864 US grants and 1,597 published applications in this corpus.
Search patents in C11D- Granted patents
- 1,864
- Published applications
- 1,597
- Assignees
- 665
- Inventors
- 2,999
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 12 | 0 |
| 1977 | 16 | 0 |
| 1978 | 13 | 0 |
| 1979 | 9 | 0 |
| 1980 | 6 | 0 |
| 1981 | 13 | 0 |
| 1982 | 10 | 0 |
| 1983 | 10 | 0 |
| 1984 | 7 | 0 |
| 1985 | 6 | 0 |
| 1986 | 6 | 0 |
| 1987 | 14 | 0 |
| 1988 | 11 | 0 |
| 1989 | 21 | 0 |
| 1990 | 27 | 0 |
| 1991 | 49 | 0 |
| 1992 | 57 | 0 |
| 1993 | 51 | 0 |
| 1994 | 38 | 0 |
| 1995 | 45 | 0 |
| 1996 | 53 | 0 |
| 1997 | 62 | 0 |
| 1998 | 74 | 0 |
| 1999 | 58 | 0 |
| 2000 | 61 | 0 |
| 2001 | 58 | 17 |
| 2002 | 49 | 61 |
| 2003 | 47 | 61 |
| 2004 | 45 | 84 |
| 2005 | 36 | 70 |
| 2006 | 41 | 55 |
| 2007 | 23 | 50 |
| 2008 | 35 | 49 |
| 2009 | 45 | 58 |
| 2010 | 41 | 61 |
| 2011 | 42 | 54 |
| 2012 | 46 | 73 |
| 2013 | 48 | 52 |
| 2014 | 55 | 72 |
| 2015 | 51 | 64 |
| 2016 | 46 | 64 |
| 2017 | 42 | 58 |
| 2018 | 31 | 59 |
| 2019 | 47 | 67 |
| 2020 | 45 | 78 |
| 2021 | 55 | 57 |
| 2022 | 54 | 69 |
| 2023 | 41 | 88 |
| 2024 | 37 | 66 |
| 2025 | 44 | 65 |
| 2026 | 31 | 45 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Mixed hydrocarbon insulating cleaner composition for high-voltage electricity and electronic communication equipment without power interruption6 Oct 2026US 12,753,375 B2NAUmade Co., Ltd.
- Compositions and uses of trans-1,1,1,4,4,4-hexafluoro-2-butene and 1,1-difluoroethane (R-152A)15 Sep 2026US 12,734,388 B2The Chemours Company Fc, LLC
- Cleaning compositions16 Jun 2026US 12,655,367 B2Fujifilm Electronic Materials U.S.A., Inc.
- Metal residue removing liquid, metal residue removing method, and metal wiring manufacturing method16 Jun 2026US 12,655,370 B2Tokyo Ohka Kogyo.Co., Ltd.
- Composition comprising monochlorotrifluoropropene and stabilizer, and its applications2 Jun 2026US 12,644,073 B2AGC Inc.
- Process for cleaning or removing solids from tanks8 Oct 2026US 2026/0307117 A1Wacker Chemie AG
- Cleaning composition and method of forming photoresist pattern using the same1 Oct 2026US 2026/0297466 A1Dongwoo Fine-Chem Co., Ltd.
- Cleaning composition and method of forming photoresist pattern using the same1 Oct 2026US 2026/0297467 A1Dongwoo Fine-Chem Co., Ltd.
- Cleaning composition and method of forming photoresist pattern using the same1 Oct 2026US 2026/0297468 A1Dongwoo Fine-Chem Co., Ltd.
- Cleaning composition and method of forming photoresist pattern using the same1 Oct 2026US 2026/0297469 A1Dongwoo Fine-Chem Co., Ltd.
Most cited
By later US patents
- Cleaning compositions for removing etching residue and method of using150US 5,334,332 AEKC Technology, Inc. · 1994
- Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants142US 5,866,005 AThe University of North Carolina at Chapel Hill · 1999
- Post clean treatment composition comprising an organic acid and hydroxylamine137US 5,981,454 AEKC Technology, Inc. · 1999
- Washing apparatus126US 6,691,536 B2The Procter & Gamble Company · 2004
- Germicidal, acidic hard surface cleaning compositions125US 6,221,823 B1Reckitt Benckiser N.V. · 2001