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US 12,577,508 B2Granted
Composition, and method for cleaning adhesive polymer
AssigneeResonac Corporation
InventorsKotaro Hayashi, Susumu Nakazaki
Life of this patent
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Abstract
The present invention provides a composition which is suppressed in decrease of the etching rate over time. A composition which contains; at least one of a quaternary alkyl ammonium fluoride and a hydrate of a quaternary alkyl ammonium fluoride; (A) an N-substituted amide compound that has no active hydrogen on a nitrogen atom and (B) a dipropylene glycol dimethyl ether, which serve as aprotic solvents; and an antioxidant.
Claims9
A composition comprising at least one selected from a quaternary alkylammonium fluoride or a hydrate of a quaternary alkylammonium fluoride;
- (A) an N-substituted amide compound having no active hydrogen on a nitrogen atom, and (B) dipropylene glycol dimethyl ether, as an aprotic solvent;
- and an antioxidant,
- wherein the antioxidant comprises at least one selected from the group consisting of dibutylhydroxytoluene (BHT) and butylhydroxyanisole (BHA), and
- wherein the content of the antioxidant is 55 ppm by mass to 1,000 ppm by mass.
1 more element
Dependencies are inferred from the claim text.