Cleaning composition for organic and inorganic materials, method for cleaning using the same and electronic device manufactured using the same

A cleaning method of an organic or inorganic material comprising a cleaning process of cleaning a material to be cleaned using a cleaning composition for an organic or inorganic material, the cleaning composition comprising:

• an amide-based compound and
• an amine-based compound,
• wherein a volume ratio of the amide-based compound to the amine-based compound is 1:1 to 1:99;
• wherein the amide-based compound is an amide-based compound represented by Formula 1;
• wherein the amine-based compound is an amine-based compound represented by Formula 2;
• wherein in Formula 1, each of R1 through R3 is independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C2 to C20 alkynyl group, a substituted or unsubstituted vinyl group, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C1 to C20 alcohol group, a substituted or unsubstituted C1 to C20 amine group, a substituted or unsubstituted C4 to C20 morpholinyl group, a substituted or unsubstituted C1 to C20 amide group, a substituted or unsubstituted C2 to C20 alkenyl group, and a substituted or unsubstituted C2 to C20 alkynyl group, provided that at least one of R1 through R3 is not a hydrogen atom, and optionally the R1 through R3 form one or more 5- to 8-membered cyclic rings, and
• wherein in Formula 2, each of R4 through R6 is independently a hydrogen atom, a C1 to C10 alkyl group, a C2 to C10 alkenyl group, a C2 to C10 alkynyl group, a C1 to C10 alkyl group including a heterocyclic compound having 5 to 20 ring-forming atoms, a C2 to C10 alkenyl group including a heterocyclic compound having 5 to 20 ring-forming atoms, and a C2 to C10 alkynyl group including a heterocyclic compound having 5 to 20 ring-forming atoms, and optionally the R4 through R6 form at least one 5- to 8-membered cyclic rings.

An electronic device manufactured through a manufacturing method comprising a cleaning process for cleaning a material to be cleaned using a cleaning composition for an organic or inorganic material, the cleaning composition comprising:

• an amide-based compound and
• an amine-based compound,
• wherein a volume ratio of the amide-based compound to the amine-based compound is 1:1 to 1:99;
• wherein the amide-based compound is an amide-based compound represented by Formula 1;
• wherein the amine-based compound is an amine-based compound represented by Formula 2;
• wherein in Formula 1, each of R1 through R3 is independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C2 to C20 alkynyl group, a substituted or unsubstituted vinyl group, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C1 to C20 alcohol group, a substituted or unsubstituted C1 to C20 amine group, a substituted or unsubstituted C4 to C20 morpholinyl group, or a substituted or unsubstituted C1 to C20 amide group wherein at least one of R1 through R3 is not a hydrogen atom, and optionally the R1 through R3 form one or more 5- to 8-membered cyclic rings, and
• wherein in Formula 2, each of R4 through R6 is independently a hydrogen atom, a C1 to C10 alkyl group, a C2 to C10 alkenyl group, a C2 to C10 alkynyl group, a C1 to C10 alkyl group including a heterocyclic compound having 5 to 20 ring-forming atoms, a C2 to C10 alkenyl group including a heterocyclic compound having 5 to 20 ring-forming atoms, and a C2 to C10 alkynyl group including a heterocyclic compound having 5 to 20 ring-forming atoms, and at least one of R4 through R6 is not a hydrogen atom, and optionally the R4 through R6 form one or more 5- to 8-membered cyclic rings.

A manufacturing method of an electronic device comprising a cleaning process for cleaning a material to be cleaned using a cleaning composition for an organic or inorganic material, the cleaning composition comprising:

• an amide-based compound and
• an amine-based compound,
• wherein a volume ratio of the amide-based compound to the amine-based compound is 1:1 to 1:99;
• wherein the amide-based compound is an amide-based compound represented by Formula 1;
• wherein the amine-based compound is an amine-based compound represented by Formula 2;
• wherein in Formula 1, each of R1 through R3 is independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C2 to C20 alkynyl group, a substituted or unsubstituted vinyl group, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C1 to C20 alcohol group, a substituted or unsubstituted C1 to C20 amine group, a substituted or unsubstituted C4 to C20 morpholinyl group, a substituted or unsubstituted C1 to C20 amide group, a substituted or unsubstituted C2 to C20 alkenyl group, and a substituted or unsubstituted C2 to C20 alkynyl group, and here, a maximum number of hydrogen atoms substituted to the R1 through R3 is two, and optionally the R1 through R3 form one or more 5- to 8-membered cyclic rings, and
• wherein in Formula 2, each of R4 through R6 is independently a hydrogen atom, a C1 to C10 alkyl group, a C2 to C10 alkenyl group, a C2 to C10 alkynyl group, a C1 to C10 alkyl group including a heterocyclic compound having 5 to 20 ring-forming atoms, a C2 to C10 alkenyl group including a heterocyclic compound having 5 to 20 ring-forming atoms, and a C2 to C10 alkynyl group including a heterocyclic compound having 5 to 20 ring-forming atoms, at least one of R4 through R6 is not a hydrogen atom, and optionally the R4 through R6 form one or more 5- to 8-membered cyclic rings.