Cleaning method
AssigneeNissan Chemical Corporation
InventorsHiroshi OGINO, Tetsuya SHINJO, Ryo KARASAWA, Takahisa OKUNO
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AssigneeNissan Chemical Corporation
InventorsHiroshi OGINO, Tetsuya SHINJO, Ryo KARASAWA, Takahisa OKUNO
Estimating the term…
A cleaning method that includes removing an adhesive residue remaining on a debonded semiconductor substrate with a cleaning agent composition. The cleaning agent composition contains a tetrahydrocarbylammonium fluoride, a ring-structure-having ether compound that including at least one cycloalkyl (chain alkyl) ether compound, cycloalkyl (branched alkyl) ether compound, or a di(cycloalkly) ether compound, and an organic solvent that includes a lactam compound represented by formula (1), where R101 represents a C1 to C6 alkyl group; and R102 represents a C1 to C6 alkylene group.
A cleaning method for removing an adhesive residue remaining on a debonded substrate, the method comprising:
Dependencies are inferred from the claim text.