B81C 1/00785
Avoid chemical alteration
Official title: {Avoid chemical alteration, e.g. contamination, oxidation or unwanted etching (B81C1/00563 - B81C1/00595 take precedence)}
B81C1/00785 (Avoid chemical alteration) appears on 193 US grants and 209 published applications in this corpus.
Search patents in B81C- Granted patents
- 193
- Published applications
- 209
- Assignees
- 94
- Inventors
- 445
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 2 |
| 2002 | 2 | 2 |
| 2003 | 3 | 4 |
| 2004 | 3 | 6 |
| 2005 | 5 | 7 |
| 2006 | 4 | 4 |
| 2007 | 4 | 7 |
| 2008 | 4 | 8 |
| 2009 | 5 | 8 |
| 2010 | 5 | 7 |
| 2011 | 6 | 7 |
| 2012 | 3 | 9 |
| 2013 | 10 | 10 |
| 2014 | 14 | 13 |
| 2015 | 13 | 14 |
| 2016 | 10 | 17 |
| 2017 | 16 | 18 |
| 2018 | 16 | 12 |
| 2019 | 18 | 10 |
| 2020 | 13 | 10 |
| 2021 | 10 | 8 |
| 2022 | 8 | 8 |
| 2023 | 3 | 2 |
| 2024 | 3 | 6 |
| 2025 | 5 | 9 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- MEMS device manufacturing method4 Aug 2026US 12,698,203 B2Commissariat A L' Energie Atomique Et Aux Energies Alternatives
- Barrier structure within a microelectronic enclosure23 Sep 2025US 12,421,104 B2Texas Instruments Incorporated
- Gas sensor and manufacturing method thereof27 May 2025US 12,313,611 B2Electronics and Telecommunications Research Institute
- MEMS display device with an etch-stop-layer13 May 2025US 12,298,493 B2IGNITE, Inc.
- Scanning mirror and manufacturing method for scanning mirror13 May 2025US 12,298,494 B2Tohoku University
- Manufacturing method for microelectromechanical devices and microelectromechanical device thereof20 Aug 2026US 2026/0242211 A1STMicroelectronics International N. V.
- Barrier structure within a microelectronic enclosure4 Dec 2025US 2025/0368501 A1Texas Instruments Incorporated
- Mems device and method for fabricating a mems device4 Dec 2025US 2025/0373966 A1Infineon Technologies AG
- Device including mems sensor and method of manufacturing the same30 Oct 2025US 2025/0333294 A1Infineon Technologies AG
- Method and carrier substrate for producing a semiconductor component2 Oct 2025US 2025/0308911 A1Jenoptik Optical System GmbH
Most cited
By later US patents
- Micromechanical device and methods to fabricate same using hard mask resistant to structure release etch140US 8,440,523 B1International Business Machines Corporation · 2013
- Encapsulants for protecting MEMS devices during post-packaging release etch116US 6,956,283 B12005
- Fabrication of a surface micromachined capacitive microphone using a dry-etch process97US 5,573,679 AAlberta Microelectronic Centre · 1996
- Barrier layers for microelectromechanical systems93US 6,849,471 B2Reflectivity, INC · 2005
- Methods for producing MEMS with protective coatings using multi-component sacrificial layers62US 7,450,295 B2QUALCOMM MEMS Technologies, Inc. · 2008