B81C 1/00793
Avoid contamination
Official title: {Avoid contamination, e.g. absorption of impurities or oxidation}
B81C1/00793 (Avoid contamination) appears on 33 US grants and 44 published applications in this corpus.
Search patents in B81C- Granted patents
- 33
- Published applications
- 44
- Assignees
- 24
- Inventors
- 98
- Latest grant
- 23 Sep 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 1 |
| 2003 | 1 | 0 |
| 2004 | 0 | 1 |
| 2005 | 1 | 1 |
| 2006 | 2 | 2 |
| 2007 | 0 | 2 |
| 2008 | 1 | 0 |
| 2009 | 1 | 2 |
| 2010 | 0 | 1 |
| 2011 | 2 | 0 |
| 2012 | 0 | 1 |
| 2013 | 0 | 2 |
| 2014 | 2 | 1 |
| 2015 | 2 | 7 |
| 2016 | 0 | 0 |
| 2017 | 5 | 3 |
| 2018 | 1 | 1 |
| 2019 | 3 | 4 |
| 2020 | 3 | 3 |
| 2021 | 3 | 2 |
| 2022 | 3 | 2 |
| 2023 | 0 | 0 |
| 2024 | 0 | 2 |
| 2025 | 2 | 5 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Barrier structure within a microelectronic enclosure23 Sep 2025US 12,421,104 B2Texas Instruments Incorporated
- Scanning mirror and manufacturing method for scanning mirror13 May 2025US 12,298,494 B2Tohoku University
- Electronic device and method for manufacturing an electronic device8 Nov 2022US 11,492,250 B2TDK Corporation
- Freezing a sacrificial material in forming a semiconductor25 Oct 2022US 11,482,409 B2Micron Technology, Inc.
- Pressure sensor and manufacturing method thereof1 Mar 2022US 11,262,262 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Manufacturing method for microelectromechanical devices and microelectromechanical device thereof20 Aug 2026US 2026/0242211 A1STMicroelectronics International N. V.
- Barrier structure within a microelectronic enclosure4 Dec 2025US 2025/0368501 A1Texas Instruments Incorporated
- Mems device and method for fabricating a mems device4 Dec 2025US 2025/0373966 A1Infineon Technologies AG
- Device including mems sensor and method of manufacturing the same30 Oct 2025US 2025/0333294 A1Infineon Technologies AG
- Micromechanical component and corresponding production method15 May 2025US 2025/0157998 A1
Most cited
By later US patents
- Fabrication of a surface micromachined capacitive microphone using a dry-etch process97US 5,573,679 AAlberta Microelectronic Centre · 1996
- Barrier layers for microelectromechanical systems93US 6,849,471 B2Reflectivity, INC · 2005
- Flip-chip assembly of protected micromechanical devices45US 6,507,082 B2Texas Instruments Incorporated · 2003
- Diffusion barrier layer for MEMS devices20US 7,630,114 B2Idc, LLC · 2009
- Display apparatus and method of manufacturing the same12US 10,338,449 B2Samsung Display Co., Ltd. · 2019