Scanning mirror and manufacturing method for scanning mirror
AssigneeTohoku University
InventorsKazuhiro Hane, Takashi Sasaki, Yuki Fujita
Life of this patent
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Abstract
A scanning mirror that prevents the oxidation or hydroxylation of a torsion bar, thereby suppressing deterioration of the torsion bar and a manufacturing method for the scanning mirror. The scanning mirror has a torsion bar provided so as to support a mirror portion and of which the surface is covered with an atomic layer deposition (ALD) layer. The scanning mirror is configured such that the mirror portion can be rotated around an axis that extends along the torsion bar when torsional force is applied to the torsion bar. The scanning mirror is manufactured by forming the mirror portion and the torsion bar and then forming the ALD layer on at least the surface of the torsion bar.
Claims7
A scanning mirror comprising:
- a support electrode having a rectangular frame shape;
- four beam portions arranged so that two beam portions are arranged side by side along a pair of long sides of a rectangular inner edge of the support electrode and are connected to the support electrode on the central portion side of the long side of the inner edge;
- two connecting bars provided so as to connect the beam portions facing each other on one short side and the other short side of the inner edge of the support electrode, respectively;
- a mirror portion;
- a torsion bar being parallel to each long side of the inner edge of the support electrode, and each provided so as to connect the central portion of each connecting bar and the mirror portion, and provided so as to support the mirror portion;
- and
- two application electrodes provided in portions facing the support electrode and the beam portions, wherein
- the surfaces of the beam portions, the connecting bars and the torsion bars are covered with an atomic layer deposition (ALD) layer,
- one of the application electrodes is provided so as to face a region on one long side of the inner edge of the support electrode and two beam portions along the long side thereof, and the other application electrode is provided so as to face a region on the other long side of the inner edge of the support electrode and two beam portions along the long side thereof,
- the ALD layer has a thickness of 0.5 nm to 40 nm, and
- the scanning mirror is configured such that the mirror portion can be rotated around an axis extending along the torsion bar when torsional force is applied to the torsion bar.
A manufacturing method for a scanning mirror comprising:
- a support electrode having a rectangular frame shape;
- four beam portions arranged so that two beam portions are arranged side by side along a pair of long sides of a rectangular inner edge of the support electrode and are connected to the support electrode on the central portion side of the long side of the inner edge;
- two connecting bars provided so as to connect the beam portions facing each other on one short side and the other short side of the inner edge of the support electrode, respectively;
- a mirror portion;
- a torsion bar being parallel to each long side of the inner edge of the support electrode, and each provided so as to connect the central portion of each connecting bar and the mirror portion, and provided so as to support the mirror portion;
- two application electrodes provided in portions facing the support electrode and the beam portions, wherein
- one of the application electrodes is provided so as to face a region on one long side of the inner edge of the support electrode and two beam portions along the long side thereof, and the other application electrode is provided so as to face a region on the other long side of the inner edge of the support electrode and two beam portions along the long side thereof,
- the mirror portion can be rotated around an axis extending along a torsion bar when torsional force is applied to the torsion bar provided so as to support the mirror portion, the manufacturing method comprising:
- forming an atomic layer deposition (ALD) layer, with a thickness of 0.5 nm to 40 nm, at least on a surface of the beam portions, the connection bars and the torsion bar by an atomic layer deposition method after the support electrode, the beam portions, the connecting bars, the mirror portion, the torsion bar and the application electrodes are formed.
Dependencies are inferred from the claim text.