H10W 20/043
For electroplating
Official title: {for electroplating}
H10W20/043 (For electroplating) appears on 1,352 US grants and 1,557 published applications in this corpus.
Search patents in H10W- Granted patents
- 1,352
- Published applications
- 1,557
- Assignees
- 294
- Inventors
- 2,386
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 3 | 0 |
| 1998 | 1 | 0 |
| 1999 | 8 | 0 |
| 2000 | 22 | 0 |
| 2001 | 53 | 26 |
| 2002 | 75 | 75 |
| 2003 | 65 | 63 |
| 2004 | 60 | 69 |
| 2005 | 58 | 97 |
| 2006 | 46 | 83 |
| 2007 | 56 | 81 |
| 2008 | 46 | 102 |
| 2009 | 48 | 93 |
| 2010 | 55 | 73 |
| 2011 | 78 | 57 |
| 2012 | 52 | 67 |
| 2013 | 54 | 29 |
| 2014 | 55 | 62 |
| 2015 | 40 | 70 |
| 2016 | 62 | 60 |
| 2017 | 63 | 49 |
| 2018 | 49 | 57 |
| 2019 | 61 | 51 |
| 2020 | 54 | 66 |
| 2021 | 46 | 48 |
| 2022 | 24 | 39 |
| 2023 | 32 | 44 |
| 2024 | 33 | 38 |
| 2025 | 26 | 26 |
| 2026 | 24 | 32 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Semiconductor packages with wettable flanks and related methods6 Oct 2026US 12,757,696 B2Semiconductor Components Industries, LLC
- Conductive structures and methods of forming the same8 Sep 2026US 12,733,465 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Methods for etch barrier deposition and devices made according to the same8 Sep 2026US 12,733,467 B2Georgia Tech Research Corporation
- Semiconductor device and method28 Jul 2026US 12,696,741 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Package structure and method for fabricating the same14 Jul 2026US 12,685,106 B2National Yang Ming.Chiao Tung University
- Package structure and method for fabricating the same8 Oct 2026US 2026/0314354 A1National Yang Ming.Chiao Tung University
- Conductive structures and methods of forming the same8 Oct 2026US 2026/0314355 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Conductive vias for redistribution lines in semiconductor devices1 Oct 2026US 2026/0305295 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor structures and methods of forming the same1 Oct 2026US 2026/0305303 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Co-integration of Airbridges and 3D Integration Modules24 Sep 2026US 2026/0293678 A1
Most cited
By later US patents
- Method of forming graded thin films using alternating pulses of vapor phase reactants1,034US 6,534,395 B2ASM Microchemistry Oy · 2003
- Plated copper interconnect structure621US 5,969,422 AAdvanced Micro Devices, Inc. · 1999
- Method and structure to improve reliability of copper interconnects562US 7,129,165 B2ASM Nutool, Inc. · 2006
- Plasma pre-treating surfaces for atomic layer deposition548US 7,498,242 B2ASM America, Inc. · 2009
- Copper barrier reflow process employing high speed optical annealing535US 7,312,148 B2APPLIED Materials.Inc. · 2007