H10P 14/6504
In-situ cleaning
Official title: {In-situ cleaning}
H10P14/6504 (In-situ cleaning) appears on 243 US grants and 214 published applications in this corpus.
Search patents in H10P- Granted patents
- 243
- Published applications
- 214
- Assignees
- 125
- Inventors
- 662
- Latest grant
- 2 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 4 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 5 | 0 |
| 1994 | 7 | 0 |
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 9 | 0 |
| 2000 | 10 | 0 |
| 2001 | 11 | 2 |
| 2002 | 15 | 6 |
| 2003 | 5 | 6 |
| 2004 | 5 | 6 |
| 2005 | 4 | 6 |
| 2006 | 7 | 10 |
| 2007 | 5 | 5 |
| 2008 | 0 | 3 |
| 2009 | 4 | 5 |
| 2010 | 8 | 4 |
| 2011 | 5 | 2 |
| 2012 | 5 | 12 |
| 2013 | 7 | 5 |
| 2014 | 6 | 13 |
| 2015 | 11 | 13 |
| 2016 | 13 | 16 |
| 2017 | 11 | 10 |
| 2018 | 11 | 8 |
| 2019 | 11 | 11 |
| 2020 | 9 | 7 |
| 2021 | 8 | 15 |
| 2022 | 3 | 8 |
| 2023 | 9 | 12 |
| 2024 | 5 | 16 |
| 2025 | 9 | 10 |
| 2026 | 5 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Epitaxial strontium titanate on silicon2 Jun 2026US 12,648,373 B2Psiquantum, Corp.
- Integrated method and tool for high quality selective silicon nitride deposition31 Mar 2026US 12,592,369 B2APPLIED Materials.Inc.
- Transistor and method for fabricating the same10 Mar 2026US 12,575,247 B2Beijing Hua Tan Yuan Xin Electronics Technology Co., Ltd
- Sequencing chip and manufacturing method therefor27 Jan 2026US 12,538,721 B2Bgi Shenzhen
- Area selective deposition templated by hydrogen and halogen resists6 Jan 2026US 12,518,967 B1National Technology & Engineering Solutions of Sandia, LLC
- Integrated substrate processing apparatus and method20 Aug 2026US 2026/0245835 A1Picosun Oy
- Equal matching of oxidation rate between sige and si through clustered pre-clean and pre-surface nitridation13 Aug 2026US 2026/0239898 A1APPLIED Materials.Inc.
- Alkynes and alkenes for blocking film deposition on silicon22 Jan 2026US 2026/0026270 A1APPLIED Materials.Inc.
- Semiconducting graphene and preparation method thereof, full carbon structure and preparation method thereof11 Dec 2025US 2025/0380479 A1Tianjin University
- Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and recording medium13 Nov 2025US 2025/0349533 A1Kokusai Electric Corporation
Most cited
By later US patents
- Method for forming a thin layer on a semiconductor substrate and apparatus therefor628US 5,178,682 AMitsubishi Denki Kabushiki Kaisha · 1993
- Method for forming silicon-containing materials during a photoexcitation deposition process535US 7,651,955 B2APPLIED Materials.Inc. · 2010
- Method for forming silicon-containing materials during a photoexcitation deposition process497US 7,648,927 B2APPLIED Materials.Inc. · 2010
- System and method for gas-phase sulfur passivation of a semiconductor surface483US 9,558,931 B2ASM IP Holding B. V. · 2017
- Plasma pre-clean module and process477US 9,299,557 B2ASM IP Holding B. V. · 2016