H01J 37/3488
Constructional details of particle beam apparatus not otherwise provided for
Official title: {Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus}
H01J37/3488 (Constructional details of particle beam apparatus not otherwise provided for) appears on 433 US grants and 483 published applications in this corpus.
Search patents in H01J- Granted patents
- 433
- Published applications
- 483
- Assignees
- 262
- Inventors
- 1,236
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 4 | 0 |
| 1980 | 1 | 0 |
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 3 | 0 |
| 1984 | 4 | 0 |
| 1985 | 3 | 0 |
| 1986 | 3 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 5 | 0 |
| 1993 | 12 | 0 |
| 1994 | 9 | 0 |
| 1995 | 10 | 0 |
| 1996 | 9 | 0 |
| 1997 | 15 | 0 |
| 1998 | 7 | 0 |
| 1999 | 7 | 0 |
| 2000 | 2 | 0 |
| 2001 | 8 | 2 |
| 2002 | 3 | 7 |
| 2003 | 4 | 3 |
| 2004 | 7 | 12 |
| 2005 | 8 | 15 |
| 2006 | 5 | 17 |
| 2007 | 0 | 20 |
| 2008 | 4 | 11 |
| 2009 | 5 | 9 |
| 2010 | 7 | 8 |
| 2011 | 7 | 14 |
| 2012 | 2 | 16 |
| 2013 | 7 | 17 |
| 2014 | 5 | 20 |
| 2015 | 18 | 21 |
| 2016 | 13 | 38 |
| 2017 | 12 | 26 |
| 2018 | 27 | 47 |
| 2019 | 25 | 36 |
| 2020 | 35 | 32 |
| 2021 | 33 | 26 |
| 2022 | 19 | 27 |
| 2023 | 23 | 25 |
| 2024 | 18 | 15 |
| 2025 | 28 | 15 |
| 2026 | 9 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Deposition system and method1 Sep 2026US 12,727,404 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Multicathode PVD system for high aspect ratio barrier seed deposition25 Aug 2026US 12,716,125 B2APPLIED Materials.Inc.
- Molybdenum sputtering target assembly and method of making11 Aug 2026US 12,703,907 B2Solstice Advanced Materials US, Inc.
- Diffusion bonded tungsten containing target to titanium or titanium alloy backing plate2 Jun 2026US 12,644,174 B2Solstice Advanced Materials US, Inc.
- Sputtering target and method for producing same19 May 2026US 12,630,917 B2JX Advanced Metals Corporation
- Pvd target structure and method for preparing the same30 Jul 2026US 2026/0218370 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Apparatus For Depositing Material Layers on a Substrate23 Jul 2026US 2026/0209932 A1
- CoZrTa(X) Sputtering Target with Improved Magnetic Properties25 Jun 2026US 2026/0176744 A1Materion Advanced Materials Germany GmbH
- Apparatus for cooling a sputtering target5 Mar 2026US 2026/0062796 A1Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
- Tungsten silicide target and method for manufacturing same, and method for manufacturing tungsten silicide film27 Nov 2025US 2025/0361599 A1JX Advanced Metals Corporation
Most cited
By later US patents
- Process kit and target for substrate processing chamber379US 9,127,362 B2APPLIED Materials.Inc. · 2015
- Physical vapor deposition employing ion extraction from a plasma236US 5,482,611 A1996
- Sputtering process and apparatus180US 4,166,018 AAirco, Inc. · 1979
- Rotating sputtering apparatus for selected erosion118US 5,252,194 AVarian Associates, Inc. · 1993
- Integrated sputtering target assembly93US 5,565,071 AAPPLIED Materials.Inc. · 1996