H01J 37/3497
Temperature of target
Official title: {Temperature of target}
H01J37/3497 (Temperature of target) appears on 168 US grants and 150 published applications in this corpus.
Search patents in H01J- Granted patents
- 168
- Published applications
- 150
- Assignees
- 109
- Inventors
- 425
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 2 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 3 | 0 |
| 1984 | 4 | 0 |
| 1985 | 3 | 0 |
| 1986 | 3 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 5 | 0 |
| 1993 | 9 | 0 |
| 1994 | 4 | 0 |
| 1995 | 5 | 0 |
| 1996 | 5 | 0 |
| 1997 | 6 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 1 | 0 |
| 2001 | 3 | 0 |
| 2002 | 1 | 2 |
| 2003 | 1 | 1 |
| 2004 | 4 | 6 |
| 2005 | 4 | 8 |
| 2006 | 2 | 12 |
| 2007 | 0 | 15 |
| 2008 | 2 | 5 |
| 2009 | 5 | 5 |
| 2010 | 4 | 4 |
| 2011 | 2 | 7 |
| 2012 | 2 | 7 |
| 2013 | 4 | 7 |
| 2014 | 4 | 11 |
| 2015 | 5 | 3 |
| 2016 | 4 | 6 |
| 2017 | 6 | 6 |
| 2018 | 8 | 7 |
| 2019 | 6 | 10 |
| 2020 | 8 | 7 |
| 2021 | 9 | 5 |
| 2022 | 5 | 5 |
| 2023 | 4 | 6 |
| 2024 | 4 | 1 |
| 2025 | 7 | 3 |
| 2026 | 2 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Deposition system and method1 Sep 2026US 12,727,404 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Sputtering targets, and related apparatuses and methods21 Apr 2026US 12,609,288 B1Seagate Technology LLC
- Shutter disk for physical vapor deposition (PVD) chamber24 Jun 2025US 12,338,527 B2APPLIED Materials.Inc.
- Method of forming material layer17 Jun 2025US 12,334,357 B2Research & Business Foundation Sungkyunkwan University
- Magnetron sputter device1 Apr 2025US 12,266,516 B2Daegu Gyeongbuk Institute of Science and Technology
- Apparatus for cooling a sputtering target5 Mar 2026US 2026/0062796 A1Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
- Device for vacuum deposition system and system for vacuum deposition18 Sep 2025US 2025/0290197 A1
- Plasma deposition apparatus and plasma deposition method11 Sep 2025US 2025/0285836 A1Samsung Electronics Co., Ltd.
- Deposition system and method24 Apr 2025US 2025/0132148 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Magnetron sputter device20 Jun 2024US 2024/0203715 A1Daegu Gyeongbuk Institute of Science and Technology
Most cited
By later US patents
- Physical vapor deposition employing ion extraction from a plasma236US 5,482,611 A1996
- Sputtering process and apparatus180US 4,166,018 AAirco, Inc. · 1979
- Integrated sputtering target assembly93US 5,565,071 AAPPLIED Materials.Inc. · 1996
- Sputtering device and target with cover to hold cooling fluid76US 5,433,835 AAPPLIED Materials.Inc. · 1995
- Integrated sputtering target assembly65US 5,487,822 AAPPLIED Materials.Inc. · 1996