Shutter disk for physical vapor deposition (PVD) chamber

A non-transitory computer readable storage medium having stored thereon instructions that when executed by a processor perform a method for cleaning a process kit disposed in an inner volume of a physical vapor deposition (PVD) chamber having a sputtering target disposed in the inner volume of the PVD chamber, the process kit having a carbon-based material adhered thereto, the method comprising:

• positioning a non-sputtering shutter disk on a substrate support of the PVD chamber;
• energizing an oxygen-containing cleaning gas in a remote plasma source to create a plasma reactive with carbon-based materials and directing the plasma into the inner volume of the PVD chamber;
• maintaining the sputtering target at a first temperature;
• and
• separate from the plasma, actively heating the process kit to a second temperature that is greater than the first temperature while exposed to the plasma to remove at least a portion of the carbon-based material adhered to the process kit.