Integrated sputtering target assembly
AssigneeApplied Materials, Inc.
InventorsRichard E. Demaray, David E. Berkstresser, Manuel J. Herrera
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AssigneeApplied Materials, Inc.
InventorsRichard E. Demaray, David E. Berkstresser, Manuel J. Herrera
Estimating the term…
A target plate assembly completely covers and seals against a top opening of a sputtering processing chamber. Cooling liquid connections are provided only from the perimeter of the target assembly. When a top vacuum chamber seals the side opposite the pressure chamber, the pressure on both sides of the target assembly is nearly equalized. Large thin target assemblies, such as large flat plates used for flat panel displays can be sputtered effectively and uniformly without adverse sputtering effects due to target deflection or cooling deficiencies. A target, target backing plate, and cover plate form the target plate assembly. The sputtering target assembly includes an integral cooling passage. A series of grooves are constructed in either the target backing plate or the target backing cooling cover plate, which are then securely bonded to one another. The sputtering target can be a single monolith with a target backing plate or can be securely attached to the target backing plate by one of any number of conventional bonding methods. Tantalum to titanium, titanium to titanium and aluminum to titanium, diffusion bonding can be used. The energized target assembly is protected from adjacent components by overlapping insulators to prevent accidents and isolate the target assembly from other components. An electrical connection to the target assembly remains unconnected until a vacuum is produced in the top chamber.
A sputtering target assembly comprising:
A sputtering target assembly comprising:
A sputtering target assembly for a sputtering apparatus including a sputtering chamber having a sputtering opening having an inside perimeter pattern, a first side of the sputtering target assembly is sealed against the opening outside the pattern and including a pressure equalizing chamber sealed to a second side of said sputtering target assembly generally opposite the location where the target assembly is sealed on the first side, the target assembly acting as a diaphragm type barrier between the sputtering chamber and the pressure equalizing chamber comprising:
A sputtering target assembly for a sputtering apparatus including a sputtering chamber having a sputtering opening having an inside perimeter pattern, a first side of the sputtering target assembly is sealed against the opening outside the pattern and including a pressure equalizing chamber scaled to a second side of said sputtering target assembly generally opposite the location where the target assembly is sealed on the first side, the target assembly acting as a diaphragm between the sputtering chamber and the pressure equalizing chamber comprising:
Dependencies are inferred from the claim text.