Pvd target structure and method for preparing the same

A method for preparing physical vapor deposition (PVD) target structure, the method comprising:

• receiving a target body having a first planar side and a second planar side opposite to the first planar side, with a sidewall perpendicular to and intersecting both the first planar side and the second planar side;
• and knurling an edge region of the first planar side of the target body to form a knurled profile in the edge region, wherein knurling the edge region of the first planar side of the target body comprises:
• forming a plurality of concave structures and a plurality of convex structures in the edge region of the first planar side of the target body, the plurality of concave structures and the plurality of convex structures arranged alternately, and wherein the concave structure has a shape of an inverted frustum of a pyramid, and the convex structure has a shape of a frustum of a pyramid.

A method for performing a physical vapor deposition process, the method comprising:

• installing a planar PVD target structure in a PVD chamber, the planar PVD target structure comprises a first side and a second side opposite to the first side, with a sidewall perpendicular to and intersecting both the first planar side and the second planar side, the first side comprises a knurled region in proximity to an edge of the first side;
• and positioning a substrate in the PVD chamber, the substrate has an upper surface facing the first side of the planar PVD target structure, wherein the knurled region of the planar PVD target structure projects over a region outside the substrate.