US 9,127,362 B2 · Process kit and target for substrate processing chamber

Abstract

A process kit comprises a ring assembly that is placed about a substrate support in a substrate processing chamber to reduce deposition of process deposits on the chamber components and on an overhang edge of the substrate. The process kit includes a deposition ring, cover ring, and anti-lift bracket, and can also include a unitary shield. A target is also described.

Claims25

Dependent claims

A cover ring for at least partially covering a deposition ring placed about a substrate support, the cover ring comprising:

(a) an annular wedge comprising:
(i) a projecting brim overlying the deposition ring, the projecting brim terminating in an edge and having a downwardly extending raised ridge;
(ii) an inclined surface that extends continuously from an outer cylindrical wall to the edge of the projecting brim, the inclined surface being inclined at an angle relative to the axis perpendicular to the plane of the substrate support;
and
(iii) a downwardly extending footing which rests on the deposition ring;
and
(b) the outer cylindrical wall and an inner cylindrical wall extending downwardly from the annular wedge.

4 more elements

A ring assembly for placement about a substrate support in a substrate processing chamber in which a plasma of process gas is formed to process the substrate, the support comprising a peripheral wall that terminates before an overhanging edge of the substrate, and the ring assembly comprising:

(a) a deposition ring comprising an annular band surrounding the peripheral wall of the support, the annular band comprising:
(i) an inner lip that extends transversely from the annular band, is substantially parallel to the peripheral wall of the support, and terminates below the overhanging edge of the substrate;
(ii) a raised ridge;
(iii) an inner open channel between the inner lip and the raised ridge, and that extends at least partially below the overhanging edge of the substrate;
and
(iv) a ledge radially outward of the raised ridge;
and
(b) A cover ring for at least partially covering a deposition ring placed about a substrate support, the cover ring comprising:
(i) an annular wedge comprising:
(1) a projecting brim overlying the deposition ring, the projecting brim terminating in an edge and having a downwardly extending raised ridge;
(2) an inclined surface that extends continuously from an outer cylindrical wall to the edge of the projecting brim, the inclined surface being inclined at an angle relative to the axis perpendicular to the plane of the substrate support;
and
(3) a downwardly extending footing which rests on a deposition ring;
and
(ii) the outer cylindrical wall and an inner cylindrical wall extending downwardly from the annular wedge.

12 more elements

A process kit for placement about a sputtering surface of a sputtering target that faces a substrate support in a substrate processing chamber to reduce deposition of sputtering deposits on the support and sidewalls of the chamber, the support comprising a peripheral wall that terminates below an overhanging edge of the substrate and a restraint beam, the process kit comprising:

(a) a deposition ring comprising an annular band surrounding the support, the deposition ring having an inner lip extending transversely from the annular band, the inner lip being substantially parallel to the peripheral wall of the support and terminating below the overhanging edge of the substrate;
a raised ridge;
an inner open channel between the inner lip and the raised ridge, the inner open channel extending at least partially below the overhanging edge of the substrate;
a ledge radially outward of the raised ridge;
and a peripheral recessed pocket with a holding post;
(b) a cover ring comprising an annular wedge comprising (i) a projecting brim overlying the deposition ring, the projecting brim terminating in an edge and having a downwardly extending raised ridge;
(ii) an inclined surface that extends continuously from an outer cylindrical wall to the edge of the projecting brim, the inclined surface being inclined at an angle relative to the axis perpendicular to the plane of the substrate support;
and (iii) a downwardly extending footing which rests on the deposition ring;
and the outer-cylindrical wall and an inner cylindrical wall extending downwardly from the annular wedge;
and
(c) an anti-lift bracket comprising a block comprising a through-channel to receive an end of a restraint beam of the support and a retaining hoop sized to slide over the holding post in the recessed pocket of the deposition ring.

8 more elements

Dependencies are inferred from the claim text.

Facts

Application

11/553,982Filed 27 Oct 2006 · us provisional application

Priority

31 Oct 2005

Published

US 2007/0102286 A110 May 2007

Granted

8 Sep 2015

Term ends

Not estimatedThe source records don’t support an estimate.

Classification10 codes

H01J 37/3488
Operating with cathodic sputtering: constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting,…
C23C 14/3407
Sputtering: cathode assembly for sputtering apparatus, e.g. Target
C23C 14/50
Characterised by the process of coating: substrate holders
H01J 37/34
Gas-filled discharge tubes: operating with cathodic sputtering

Abstract

Claims25

Dependent claims

A cover ring for at least partially covering a deposition ring placed about a substrate support, the cover ring comprising:

(a) an annular wedge comprising:
(i) a projecting brim overlying the deposition ring, the projecting brim terminating in an edge and having a downwardly extending raised ridge;
(ii) an inclined surface that extends continuously from an outer cylindrical wall to the edge of the projecting brim, the inclined surface being inclined at an angle relative to the axis perpendicular to the plane of the substrate support;
and
(iii) a downwardly extending footing which rests on the deposition ring;
and
(b) the outer cylindrical wall and an inner cylindrical wall extending downwardly from the annular wedge.

4 more elements

(a) a deposition ring comprising an annular band surrounding the peripheral wall of the support, the annular band comprising:
(i) an inner lip that extends transversely from the annular band, is substantially parallel to the peripheral wall of the support, and terminates below the overhanging edge of the substrate;
(ii) a raised ridge;
(iii) an inner open channel between the inner lip and the raised ridge, and that extends at least partially below the overhanging edge of the substrate;
and
(iv) a ledge radially outward of the raised ridge;
and
(b) A cover ring for at least partially covering a deposition ring placed about a substrate support, the cover ring comprising:
(i) an annular wedge comprising:
(1) a projecting brim overlying the deposition ring, the projecting brim terminating in an edge and having a downwardly extending raised ridge;
(2) an inclined surface that extends continuously from an outer cylindrical wall to the edge of the projecting brim, the inclined surface being inclined at an angle relative to the axis perpendicular to the plane of the substrate support;
and
(3) a downwardly extending footing which rests on a deposition ring;
and
(ii) the outer cylindrical wall and an inner cylindrical wall extending downwardly from the annular wedge.

12 more elements

(a) a deposition ring comprising an annular band surrounding the support, the deposition ring having an inner lip extending transversely from the annular band, the inner lip being substantially parallel to the peripheral wall of the support and terminating below the overhanging edge of the substrate;
a raised ridge;
an inner open channel between the inner lip and the raised ridge, the inner open channel extending at least partially below the overhanging edge of the substrate;
a ledge radially outward of the raised ridge;
and a peripheral recessed pocket with a holding post;
(b) a cover ring comprising an annular wedge comprising (i) a projecting brim overlying the deposition ring, the projecting brim terminating in an edge and having a downwardly extending raised ridge;
(ii) an inclined surface that extends continuously from an outer cylindrical wall to the edge of the projecting brim, the inclined surface being inclined at an angle relative to the axis perpendicular to the plane of the substrate support;
and (iii) a downwardly extending footing which rests on the deposition ring;
and the outer-cylindrical wall and an inner cylindrical wall extending downwardly from the annular wedge;
and
(c) an anti-lift bracket comprising a block comprising a through-channel to receive an end of a restraint beam of the support and a retaining hoop sized to slide over the holding post in the recessed pocket of the deposition ring.

8 more elements

Dependencies are inferred from the claim text.

Process kit and target for substrate processing chamber

Life of this patent

Abstract

Claims25

Process kit and target for substrate processing chamber

Life of this patent

Abstract

Claims25