CoZrTa(X) Sputtering Target with Improved Magnetic Properties
AssigneeMaterion Advanced Materials Germany GmbH
InventorsUwe KONIETZKA, Martin SCHLOTT
Life of this patent
Estimating the term…
Abstract
The present invention relates to a sputtering target consisting of an alloy consisting of Co, Zr, Ta and, optionally, one or more further element(s) X from the group of Mo, Pd, Ni, Ti, V, W, and B, characterized in that the target has a maximum magnetic permeability μmax of 60 or lower and/or characterized in that the target has a maximum pass through flux (PTF) variation (FMax−FMin)/FAverage of 0.2 or lower, preferably of 0.15 or lower, and most preferably of 0.10 or lower.
Claims10
Sputtering target consisting of an alloy consisting of Co, Zr, Ta and, optionally, one or more further element(s) X from the group of Mo, Pd, Ni, Ti, V, W, and B, characterized in that the target has a maximum magnetic permeability μmax of 60 or lower and/or characterized in that the target has a maximum pass through flux (PTF) variation (FMax−FMin)/FAverage of 0.2 or lower, preferably of 0.15 or lower, and most preferably of 0.10 or lower.
Sputtering target according to any one of the preceding claims wherein one or more further element(s) X from the group of Mo, Pd, Ni, Ti, V, W, and B are present in the alloy in a total amount of up to 7 at. %.
Sputtering target according to any one of the preceding claims wherein the target has a maximum magnetic permeability μmax of 50, preferably 40 or lower.
Sputtering target according to any one of the preceding claims wherein the magnetic pass through flux (PTF) of the target measured according to ASTM F2086-01 in the center of a 8 mm thick test piece is 20% or higher.
Process for producing a sputtering target consisting of an alloy consisting of Co, Zr, Ta and, optionally, one or more further element(s) X from the group of Mo, Pd, Ni, Ti, V, W, and B, characterized in that the process involves heating the alloy to a temperature in the range of 700 to 1000° C., preferably of 800 to 900° C.
Dependencies are inferred from the claim text.