H01J 37/3491
Manufacturing of targets
Official title: {Manufacturing of targets}
H01J37/3491 (Manufacturing of targets) appears on 174 US grants and 219 published applications in this corpus.
Search patents in H01J- Granted patents
- 174
- Published applications
- 219
- Assignees
- 120
- Inventors
- 530
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 2 | 0 |
| 1994 | 4 | 0 |
| 1995 | 5 | 0 |
| 1996 | 2 | 0 |
| 1997 | 4 | 0 |
| 1998 | 4 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 4 | 2 |
| 2002 | 1 | 4 |
| 2003 | 2 | 2 |
| 2004 | 3 | 6 |
| 2005 | 4 | 7 |
| 2006 | 3 | 5 |
| 2007 | 0 | 4 |
| 2008 | 2 | 6 |
| 2009 | 0 | 3 |
| 2010 | 3 | 4 |
| 2011 | 5 | 5 |
| 2012 | 0 | 6 |
| 2013 | 2 | 5 |
| 2014 | 1 | 8 |
| 2015 | 9 | 13 |
| 2016 | 5 | 24 |
| 2017 | 6 | 12 |
| 2018 | 14 | 27 |
| 2019 | 13 | 13 |
| 2020 | 20 | 15 |
| 2021 | 14 | 13 |
| 2022 | 8 | 8 |
| 2023 | 12 | 10 |
| 2024 | 4 | 8 |
| 2025 | 11 | 8 |
| 2026 | 4 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Molybdenum sputtering target assembly and method of making11 Aug 2026US 12,703,907 B2Solstice Advanced Materials US, Inc.
- Diffusion bonded tungsten containing target to titanium or titanium alloy backing plate2 Jun 2026US 12,644,174 B2Solstice Advanced Materials US, Inc.
- Sputtering target and method for producing same19 May 2026US 12,630,917 B2JX Advanced Metals Corporation
- Method for producing sputtering target material3 Mar 2026US 12,564,880 B2Sanyo Special Steel Co., Ltd.
- Sputtering target2 Dec 2025US 12,486,563 B2Plansee Japan Ltd.
- CoZrTa(X) Sputtering Target with Improved Magnetic Properties25 Jun 2026US 2026/0176744 A1Materion Advanced Materials Germany GmbH
- Tungsten silicide target and method for manufacturing same, and method for manufacturing tungsten silicide film27 Nov 2025US 2025/0361599 A1JX Advanced Metals Corporation
- Sputtering target and method for manufacturing a sputtering target11 Sep 2025US 2025/0283208 A1Plansee Japan Ltd.
- Cooling device17 Jul 2025US 2025/0233041 A1Miba Sinter Austria GmbH
- Molybdenum sputtering target assembly and method of making19 Jun 2025US 2025/0197987 A1Honeywell International Inc.
Most cited
By later US patents
- Method and apparatus for sputtering of a liquid71US 5,211,824 ASiemens Solar Industries, L. P. · 1993
- Low temperature sputter target/backing plate method and assembly58US 7,146,703 B2Tosoh SMD, Inc. · 2006
- Fabrication of clad hollow cathode magnetron sputter targets54US 6,283,357 B1Praxair S. T. Technology, Inc. · 2001
- Ceramic rotatable magnetron sputtering cathode target and process for its production53US 5,354,446 AAsahi Glass Company, Limited · 1994
- Composite sputtering target structures and process for producing such structures48US 5,215,639 AGenus, Inc. · 1993