Ceramic rotatable magnetron sputtering cathode target and process for its production
AssigneeAsahi Glass Company, Limited
InventorsOtojiro Kida, Akira Mitsui, Atsushi Hayashi
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Abstract
A ceramics rotatable magnetron sputtering cathode target comprising a cylindrical target holder and a ceramics layer as a target to be sputtered, formed on the outer surface of the target holder, wherein at least one layer selected from the group consisting of a layer of a metal or alloy having a thermal expansion coefficient of an intermediate level between the thermal expansion coefficients of the ceramics layer and the target holder, and a layer of a metal or alloy having a thermal expansion coefficient approximating to the thermal expansion coefficient of the ceramics layer, is formed as an undercoat between the ceramics layer and the target holder.
Claims3
A ceramic rotatable magnetron sputtering cathode target, comprising:
- a cylindrical target holder having an outer surface and a ceramic layer as a sputtering target, which is formed on the outer surface of the cylindrical target holder, said sputtering cathode target having placed on the outer surface of the cylindrical target holder under the ceramic layer, a layer (i) of a metal or alloy having a thermal expansion coefficient of an intermediate level between the thermal expansion coefficients of the ceramic layer and the target holder, and a layer (ii) of a metal or alloy having a thermal expansion coefficient approximating the thermal expansion coefficient of the ceramic layer.
Dependencies are inferred from the claim text.