H01J 37/3461
Means for shaping the magnetic field
Official title: {Means for shaping the magnetic field, e.g. magnetic shunts}
H01J37/3461 (Means for shaping the magnetic field) appears on 54 US grants and 81 published applications in this corpus.
Search patents in H01J- Granted patents
- 54
- Published applications
- 81
- Assignees
- 43
- Inventors
- 172
- Latest grant
- 17 Feb 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2001 | 0 | 1 |
| 2002 | 1 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 0 | 3 |
| 2006 | 1 | 2 |
| 2007 | 0 | 3 |
| 2008 | 1 | 0 |
| 2009 | 1 | 3 |
| 2010 | 0 | 1 |
| 2011 | 1 | 3 |
| 2012 | 0 | 4 |
| 2013 | 2 | 5 |
| 2014 | 2 | 5 |
| 2015 | 3 | 6 |
| 2016 | 3 | 5 |
| 2017 | 6 | 4 |
| 2018 | 6 | 1 |
| 2019 | 3 | 4 |
| 2020 | 1 | 2 |
| 2021 | 1 | 5 |
| 2022 | 5 | 9 |
| 2023 | 4 | 5 |
| 2024 | 7 | 4 |
| 2025 | 5 | 1 |
| 2026 | 1 | 4 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Plasma process apparatus17 Feb 2026US 12,555,744 B2Samsung Electronics Co., Ltd.
- Method and apparatus for sputter deposition of target material to a substrate4 Nov 2025US 12,460,300 B2Dyson Technology Limited
- EM source for enhanced plasma control10 Jun 2025US 12,325,909 B2APPLIED Materials.Inc.
- Multifocal magnetron design for physical vapor deposition processing on a single cathode22 Apr 2025US 12,283,470 B2Intevac, Inc.
- Semiconductor apparatus and magnetic structure of semiconductor apparatus14 Jan 2025US 12,198,914 B2Beijing Naura Microelectronics Equipment Co., Ltd.
- Magnetic field generating apparatus25 Jun 2026US 2026/0179893 A1Korea Advanced Institute of Science and Technology
- Anti-Stiction Process for Mems Device14 May 2026US 2026/0132019 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Sputtering apparatus, apparatus for manufacturing magnetic recording medium, thin film forming method, and method for manufacturing magnetic recording medium2 Apr 2026US 2026/0094797 A1Resonac Hard Disk Corporation
- Beam Plasma Source Enhanced Magnetron Sputtering29 Jan 2026US 2026/0031312 A1Board of Trustees of Michigan State University
- Simultaneous etching of multi-faceted substrates13 Mar 2025US 2025/0087472 A1
Most cited
By later US patents
- Method and apparatus for increasing local plasma density in magnetically confined plasma54US 7,922,880 B1Novellus Systems, Inc. · 2011
- Configurable variable position closed track magnetron33US 9,812,303 B2APPLIED Materials.Inc. · 2017
- Unbalanced plasma generating apparatus having cylindrical symmetry25US 6,497,803 B2Isoflux, Inc. · 2002
- Method and apparatus for increasing local plasma density in magnetically confined plasma7US 8,449,731 B1Novellus Systems, Inc. · 2013
- Split magnet ring on a magnetron sputter chamber5US 7,618,521 B2APPLIED Materials.Inc. · 2009