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AssigneeNovellus Systems, Inc.
InventorsAnshu A. Pradhan, Douglas B. Hayden, Ronald L. Kinder, Alexander Dulkin
Estimating the term…
Local plasma density, e.g., the plasma density in the vicinity of the substrate, is increased by providing an ion extractor configured to transfer ions and electrons from a first region of magnetically confined plasma (typically a region of higher density plasma) to a second region of plasma (typically a region of lower density plasma). The second region of plasma is preferably also magnetically shaped or confined and resides between the first region of plasma and the substrate. A positively biased conductive member positioned proximate the second region of plasma serves as an ion extractor. A positive bias of about 50-300 V is applied to the ion extractor causing electrons and subsequently ions to be transferred from the first region of plasma to the vicinity of the substrate, thereby forming higher density plasma. Provided methods and apparatus are used for deposition and resputtering.
An apparatus for processing material on a semiconductor wafer, comprising:
Dependencies are inferred from the claim text.