Magnetic field generating apparatus

A magnetic field generating apparatus comprising:

• a magnet plate positioned behind a sputtering target and comprising a plurality of magnets that are positioned on an upper surface of the magnet plate;
• and
• a magnetic field shaping pipe positioned between the magnet plate and the sputtering target,
• wherein the magnetic field shaping pipe is configured to receive a transport fluid,
• wherein a plurality of magnetic metal droplets are positioned in the transport fluid,
• wherein the plurality of magnetic metal droplets are spaced apart from each other in a horizontal direction,
• wherein each magnetic metal droplet of the plurality of magnetic metal droplets comprises a plurality of micro-magnetic particles, and
• wherein N-poles and S-poles of the plurality of magnets are configured to alternately face upwards.

A magnetic field generating apparatus comprising:

• a magnet plate positioned behind a sputtering target and comprising a plurality of magnets that are positioned on an upper surface of the magnet plate;
• a magnetic field shaping pipe positioned between the magnet plate and the sputtering target;
• and
• a support pin protruding from the upper surface of the magnet plate and connected with a portion of the magnetic field shaping pipe to support the magnetic field shaping pipe,
• wherein the magnetic field shaping pipe is configured to receive a transport fluid,
• wherein a plurality of magnetic metal droplets are positioned in the transport fluid,
• wherein the plurality of magnetic metal droplets are spaced apart from each other in a horizontal direction,
• wherein each magnetic metal droplet of the plurality of magnetic metal droplets comprises a plurality of micro-magnetic particles, and
• wherein N-poles and S-poles of the plurality of magnets are configured to alternately face upwards.