Multifocal magnetron design for physical vapor deposition processing on a single cathode

A sputtering magnetron, comprising:

• a heat sink;
• a target affixed onto a first side of the heat sink;
• and,
• a magnet arrangement comprising:
• a magnetically permeable keeper plate assembly positioned at a second side of the heat sink, opposite the first side, the magnetically permeable keeper plate assembly having an outer perimeter and a tapered edge protruding perpendicularly outwards from the outer perimeter in a direction towards both the heat sink and target;
• a first magnet array mounted onto a first surface of the magnetically permeable keeper plate assembly and on a centerline of the magnetically permeable keeper plate assembly;
• a second magnet array mounted onto a second surface of the magnetically permeable keeper plate assembly, opposite the first surface, and on the outer perimeter of the magnetically permeable keeper plate assembly;
• and
• a third magnet array mounted onto the second surface of the magnetically permeable keeper plate assembly and positioned collinearly to the centerline of the magnetically permeable keeper plate assembly.